1996
DOI: 10.1007/bf00225633
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Copper chemical vapour deposition using copper(I) hexafluoroacetylacetonate trimethylvinylsilane

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Cited by 13 publications
(13 citation statements)
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“…We observe that for D 10 cm 2 /s the data points clearly follow the scaling (74). Practically all data points remain within the strip between the two lines corresponding to Eq.…”
Section: )mentioning
confidence: 52%
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“…We observe that for D 10 cm 2 /s the data points clearly follow the scaling (74). Practically all data points remain within the strip between the two lines corresponding to Eq.…”
Section: )mentioning
confidence: 52%
“…Hence, the dependence of τϕ0 on D for strongly disordered or granular conductors ( 75) is it qualitatively different from that for sufficiently clean metals (74).…”
Section: Good Metals and Granular Conductorsmentioning
confidence: 94%
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