2004
DOI: 10.1016/j.mssp.2004.06.002
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Copper-related defects in silicon

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Cited by 30 publications
(19 citation statements)
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“…As mentioned above sulfur ions incorporated in the silicon matrix introduce several levels in the silicon band gap and one of them is very close to the mid-gap (E C À 0.52 eV [52,53]). Moreover, sulfur may create metastable pairs with copper which behave similar to Cu I -Cu S pairs [54,55]. Thus, sulfur may act as an effective recombination center in the form of interstitial ions and Cu I -S pairs.…”
Section: Discussionmentioning
confidence: 99%
“…As mentioned above sulfur ions incorporated in the silicon matrix introduce several levels in the silicon band gap and one of them is very close to the mid-gap (E C À 0.52 eV [52,53]). Moreover, sulfur may create metastable pairs with copper which behave similar to Cu I -Cu S pairs [54,55]. Thus, sulfur may act as an effective recombination center in the form of interstitial ions and Cu I -S pairs.…”
Section: Discussionmentioning
confidence: 99%
“…28,29 (6) The Cu PL defect dissociates following a 30-min anneal at 250 • C, and the amplitude of the DLTS peaks associated with Cu s increases. 30,31 If Cu is reintroduced into the sample, Cu PL reappears. Thus, the core of Cu PL must be or include, Cu s .…”
Section: Introductionmentioning
confidence: 99%
“…The in-diffusion of Cu from a metallic source must be followed by an anneal [above 400 • C, optimal at 700 • C (Ref. 31)]. The concentration of this center is estimated to be less than 0.1% of the equilibrium copper solubility at the diffusion temperature.…”
Section: Introductionmentioning
confidence: 99%
“…1,2 Copper is the fastest diffusing transition metal in Si and reacts readily with native defects, dopants, and various impurities, including itself. [3][4][5] These interactions often affect the electrical and optical properties of the material. Photoluminescence ͑PL͒ and deep-level transient spectroscopy ͑DLTS͒ studies of copper pairs 4 in Si show the presence of two related defects labeled Cu 0 and * Cu 0 , respectively.…”
mentioning
confidence: 99%
“…[3][4][5] These interactions often affect the electrical and optical properties of the material. Photoluminescence ͑PL͒ and deep-level transient spectroscopy ͑DLTS͒ studies of copper pairs 4 in Si show the presence of two related defects labeled Cu 0 and * Cu 0 , respectively. Cu 0 has been identified as the substitutional-interstitial ͕Cu s ,Cu i ͖ pair, but * Cu 0 has yet to be identified.…”
mentioning
confidence: 99%