2019
DOI: 10.1088/1757-899x/518/3/032048
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Copper Thin Film Deposited By PVD on Aluminum AA4015 Substrate for Thermal Solar Application

Abstract: The copper nanoparticles (CuNP) films have been deposited on Aluminum-4015 substrate by PVD technique. Structural of thin film layer achieved have been analyzed by X-ray diffraction (XRD). While the chemical composition percentage of the multilayers (Zn-Ni) combined with thin layer and substrate evaluated via ED-XRF, other characterization likes surface morphology have been investigated by using scanning electron microscopy (SEM), FESM and AFM. Optical properties especially thermal absorption was measured in t… Show more

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Cited by 7 publications
(3 citation statements)
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“…Today, Energy providing has taken a significant attention 14 . Access to clean energy is important for social and economic growth 15 . In the last decades, energy sources that are sustainable and renewable have been employed in a variety of applications, like solar energy.…”
Section: Literature Reviewmentioning
confidence: 99%
See 1 more Smart Citation
“…Today, Energy providing has taken a significant attention 14 . Access to clean energy is important for social and economic growth 15 . In the last decades, energy sources that are sustainable and renewable have been employed in a variety of applications, like solar energy.…”
Section: Literature Reviewmentioning
confidence: 99%
“…14 Access to clean energy is important for social and economic growth. 15 In the last decades, energy sources that are sustainable and renewable have been employed in a variety of applications, like solar energy. Solar-absorbing systems of simple designs and accepted thermal efficiency, such as SAHs, 16 are frequently used.…”
Section: Literature Reviewmentioning
confidence: 99%
“…This makes Cu-based SPR sensors more environmentally friendly and safer for various applications [22]. There are several techniques for depositing thin lms of Cu, including electrochemical deposition, physical vapor deposition (PVD), chemical vapor deposition and supercritical uid chemical deposition [23][24][25][26]. The sputtering technique, a subset of PVD, is the simplest technique for metal deposition.…”
Section: Introductionmentioning
confidence: 99%