2009
DOI: 10.1016/j.elspec.2009.03.008
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Core level photoelectron spectromicroscopy with Al Kα1 excitation at 500nm spatial resolution

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Cited by 22 publications
(16 citation statements)
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“…The inset in the figure displays the Ge 2p 3/2 XPS signal averaged over the area inside the yellow rectangle in the lower part of the image that the lateral resolution measured at the SiGe/Si interface, from the analysis of the step in the intensity of the Ge2p 3/2 signal according to ISO standards, is less than 500 nm. [5] This constitutes an improvement of nearly one order of magnitude with respect to existing data. In another experiment (Fig.…”
Section: Lateral Resolution Of Core-level Imagesmentioning
confidence: 87%
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“…The inset in the figure displays the Ge 2p 3/2 XPS signal averaged over the area inside the yellow rectangle in the lower part of the image that the lateral resolution measured at the SiGe/Si interface, from the analysis of the step in the intensity of the Ge2p 3/2 signal according to ISO standards, is less than 500 nm. [5] This constitutes an improvement of nearly one order of magnitude with respect to existing data. In another experiment (Fig.…”
Section: Lateral Resolution Of Core-level Imagesmentioning
confidence: 87%
“…Details of the preparation are given elsewhere. [5] Fig. 3 shows a single-energy XPEEM image of the cross-section of 3 µm wide epitaxial Si 0.5 Ge 0.5 layers, recorded at a photoelectron energy of 266.4 eV corresponding to the Ge 2p 3/2 transition (binding energy ∼1218 eV).…”
Section: Lateral Resolution Of Core-level Imagesmentioning
confidence: 99%
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“…The recent advent of XPS with high spatial resolution (40 to 500 nm) [1,2], as implemented in XPEEM (X-ray Photoelectron Emission Microscopy) spectromicroscopy paves the way to many applications in devices and micro-systems [3][4][5]. A novel operation mode of the PEEM, k-PEEM, was recently introduced for fast band structure investigations by spectroscopic imaging of valence electrons in the reciprocal space [6].…”
Section: Introductionmentioning
confidence: 99%
“…The details about operating procedures and principles are discussed by Heun et al [68]. New-generation XPEEM is represented by an instrument that is equipped with bandpass energy filter and is capable of providing high lateral resolution at around 0.5 µm with an X-ray source [69,70]. Kang et al [71] studied outward diffusion of Cr and Cr 2 O 3 , which occurred due to the carbon precipitation in 304 stainless steel.…”
Section: (F) Electron Probe Microanalysismentioning
confidence: 99%