Correction of high spatial frequency errors on optical surfaces by means of ion beam figuring

Ghigo, M.; Canestrari, R.; Spiga, D.; Novi, Andrea

doi:10.1117/12.734273

Cited by 25 publications

(13 citation statements)

References 1 publication

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“…Therefore, to improve the ability of correcting the mid-high spatial frequency errors, reducing the diameter of the TRF is an effective way [15] .…”

Section: Discussionmentioning

confidence: 99%

Frequency-domain analysis of computer-controlled optical surfacing processes

Zhou

Dai

Xie

et al. 2009

Sci. China Ser. E-Technol. Sci.

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Mid-high spatial frequency errors are often induced on optical surfaces polished by computer-controlled optical surfacing (CCOS) processes. In order to efficiently remove these errors, which would degrade the performances of optical systems, the ability of a CCOS process to correct the errors have been investigated based on the convolution integral model in view of the availability of material removal. To quantify the ability, some conceptions, such as figure correcting ability and material removal availability (MRA), have been proposed. The research result reveals that the MRA of the CCOS process to correct a single spatial frequency error is determined by its tool removal function (TRF), and it equals the normalized amplitude spectrum of the Fourier transform of its TRF. Finally, three sine surfaces were etched using ion beam figuring (IBF), which is a typical CCOS process. The experimental results have verified the theoretical analysis. The employed method and the conclusions of this work provide a useful mathematical basis to analyze and optimize CCOS processes.

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“…Therefore, to improve the ability of correcting the mid-high spatial frequency errors, reducing the diameter of the TRF is an effective way [15] .…”

Section: Discussionmentioning

confidence: 99%

Frequency-domain analysis of computer-controlled optical surfacing processes

Zhou

Dai

Xie

et al. 2009

Sci. China Ser. E-Technol. Sci.

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“…IBF is typically performed as the final step of fabricating high-quality mirrors (figure errors < 5 nm peak-to-valley), but it can also be used to remove several micrometres of material without degrading micro-roughness (Peverini et al, 2010). Various types of substrates can be polished by IBF, including Si, SiC (Ghigo et al, 2007), glasses and ceramics. Some of these materials are difficult to polish using traditional methods.…”

Section: Next-generation Bimorph Mirrorsmentioning

confidence: 99%

Characterization of a next-generation piezo bimorph X-ray mirror for synchrotron beamlines

Alcock

Nistea

Sutter

et al. 2015

J Synchrotron Radiat

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Piezo bimorph mirrors are versatile active optics used on many synchrotron beamlines. However, many bimorphs suffer from the 'junction effect': a periodic deformation of the optical surface which causes major aberrations to the reflected X-ray beam. This effect is linked to the construction of such mirrors, where piezo ceramics are glued directly below the thin optical substrate. In order to address this problem, a next-generation bimorph with piezos bonded to the side faces of a monolithic substrate was developed at Thales-SESO and optimized at Diamond Light Source. Using metrology feedback from the Diamond-NOM, the optical slope error was reduced to $ 0.5 mrad r.m.s. for a range of ellipses. To maximize usability, a novel holder was built to accommodate the substrate in any orientation. When replacing a firstgeneration bimorph on a synchrotron beamline, the new mirror significantly improved the size and shape of the reflected X-ray beam. Most importantly, there was no evidence of the junction effect even after eight months of continuous beamline usage. It is hoped that this new design will reinvigorate the use of active bimorph optics at synchrotron and free-electron laser facilities to manipulate and correct X-ray wavefronts.

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“…After the IBF correction process (lasted after 2.4 h) the optical quality passed from an initial value of 43 nm (rms) to 14 nm (rms), i.e. from λ/14 to λ/42 at the wavelength of 632.8 nm 25 . The initial roughness of 5 Å rms (Wyko, 10 -660 mm scan length) obtained by superpolishing was maintained also after the IBF process without any degradation.…”

Section: Fig 8 Sintered Sic Mirror Treated With Pe-cvd Cladding and mentioning

confidence: 99%

Characterization of hydrogenated silicon carbide produced by plasma enhanced chemical vapor deposition at low temperature

et al. 2007

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A new technology has been developed to grow layers of amorphous hydrogenated Silicon Carbide in vacuum, at temperatures below 100-120°C by Physical Enhanced Chemical Vapour Deposition (PE-CVD) technology. The layers have been used either to improve the surface quality of SiC mirror substrates (produced by methods different of the CVD approach, like e.g. sintered SiC) as a super-polishable cladding coatings, or to form self-sustaining thin mirrors in SiC. It should be noted that the PE-CVD claddings can be applied also to substrates different than SiC, as e.g. metals like Al or Kanigen, in order to create a high durability polishable external layer. It this paper we present the results of a wide characterization of the new material, considering the mechanical, structural and optical properties that are the most indicative parameters for its application in optics, with particular reference to the production of mirrors for ground and space astronomical applications.

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Correction of high spatial frequency errors on optical surfaces by means of ion beam figuring

Cited by 25 publications

References 1 publication

Frequency-domain analysis of computer-controlled optical surfacing processes

Frequency-domain analysis of computer-controlled optical surfacing processes

Characterization of a next-generation piezo bimorph X-ray mirror for synchrotron beamlines

Characterization of hydrogenated silicon carbide produced by plasma enhanced chemical vapor deposition at low temperature

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