Correlation between Optical and Structural Properties of Chemically Deposited CdS Thin Films

Mohammed, Raghad Y.; Abduol, S.; Mousa, Ali M.

doi:10.18052/www.scipress.com/ilcpa.30.146

Cited by 5 publications

(2 citation statements)

References 14 publications

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“…The second region is at wavelength lower than 400 nm for which transparence decreases rapidly for all samples exhibiting the onset fundamental absorption due to the transition between the valence band and the conduction band [62]. For more investigation, absorption coefficient ( ) of the NiO thin films was determined from the transmittance measurements using Swanepoel's method [63,64]:…”

Section: Opticalmentioning

confidence: 99%

Effect of Precursor Concentration on Structural Optical and Electrical Properties of NiO Thin Films Prepared by Spray Pyrolysis

Barir

Benhaoua²,

Benhamida

et al. 2017

Journal of Nanomaterials

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Undoped nickel oxide (NiO) thin films were deposited on 500 ∘ C heated glass substrates using spray pyrolysis method at (0.015-0.1 M) range of precursor. The latter was obtained by decomposition of nickel nitrate hexahydrate in double distilled water. Effect of precursor concentration on structural, optical, and electrical properties of NiO thin films was investigated. X-ray diffraction (XRD) shows the formation of NiO under cubic structure with single diffraction peak along (111) plane at 2 = 37.24 ∘ . When precursor concentration reaches 0.1 M, an increment in NiO crystallite size over 37.04 nm was obtained indicating the product nano structure. SEM images reveal that beyond 0.04 M as precursor concentration the substrate becomes completely covered with NiO and thin films exhibit formation of nano agglomerations at the top of the sample surface. Ni-O bonds vibrations modes in the product of films were confirmed by FT-IR analysis. Transparency of the films ranged from 57 to 88% and band gap energy of the films decreases from 3.68 to 3.60 eV with increasing precursor concentration. Electrical properties of the elaborated NiO thin films were correlated to the precursor concentration.

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Section: Opticalmentioning

confidence: 99%

Effect of Precursor Concentration on Structural Optical and Electrical Properties of NiO Thin Films Prepared by Spray Pyrolysis

Barir

Benhaoua²,

Benhamida

et al. 2017

Journal of Nanomaterials

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show abstract

“…Besides, the glass substrates have been cleaned ultrasonically with distilled water for 15 min, and dried in air at room temperature, and kept in a desiccator [20]. The mentioned cleaning process provides good adhesion, growth nucleation center, and uniform synthesis of thin films [21]. The 130 nm thickness of ZnO thin film was synthesized by using a one-step PVD technique.…”

Section: Methodsmentioning

confidence: 99%

Synthesis and Characterizations of ZnO Thin Films Grown by Physical Vapor Deposition Technique

Mohammed

Ahmed

Abdulrahman

et al. 2020

JASTT

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In the current study, Zinc oxide (ZnO) thin films have been synthesized over the whole the glass-slide substrate by utilizing the physical vapor deposition (PVD) technique. The Zinc (Zn) seed layer was deposited by heating the high purity Zn powder by using a molybdenum (Mo) boat at 37.503×10-3 Torr vacuum pressure of the PVD chamber. The ZnO thin films were fabricated by oxidation of the Zn seed layer coated glass-slide substrate at 400 °C. The morphological, chemical compositions, crystal quality, structural and optical properties of fabricated ZnO thin film were characterized and studied utilizing several characterization techniques. The results found that the high distribution density, homogenous, uniform, and high-quality ZnO thin film was grown over the entire substrate. The synthesized ZnO thin film with a thickness of 130 nm was grown with high purity and polycrystalline hexagonal-Wurtzite phase of ZnO. The sharp, and dominant diffraction peak was observed at peak position 34.3375 along (002) plane and c-axis. The investigated crystal size, dislocation density, and interplanar spacing were about 13.33 nm, 5.63×10-5 A°, and 2.609 A°, respectively. Also, UV-visible spectroscopy results show the high transmittance and low absorbance in the visible (Vis.) region and were about 90%, and the transmittance decreases sharply near the UV region at a wavelength around 383 nm. Besides, obtained the energy band-gap (Eg) was about 3.24 eV.

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Synthesis of lead oxide thin films by using physical vapor deposition technique

Abdulrahman

Mohammed

Ahmed

et al. 2021

Materials Today: Proceedings

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Correlation between Optical and Structural Properties of Chemically Deposited CdS Thin Films

Cited by 5 publications

References 14 publications

Effect of Precursor Concentration on Structural Optical and Electrical Properties of NiO Thin Films Prepared by Spray Pyrolysis

Effect of Precursor Concentration on Structural Optical and Electrical Properties of NiO Thin Films Prepared by Spray Pyrolysis

Synthesis and Characterizations of ZnO Thin Films Grown by Physical Vapor Deposition Technique

Synthesis of lead oxide thin films by using physical vapor deposition technique

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