Correlation between structure, stress and optical properties in direct current sputtered molybdenum oxide films

Mohamed, S. H.; Kappertz, Oliver; Ngaruiya, James M.; Pedersen, T. P. Leervad; Drese, R.; Wuttig, Matthias

doi:10.1016/s0040-6090(03)00068-3

Cited by 92 publications

(48 citation statements)

References 26 publications

Supporting

Mentioning

Contrasting

Unclassified

Order By: Relevance

“…This absorption at low photon energy has been reported earlier for MoO x and has been attributed to oxygen defects. 4,11,16,35 The refractive index (n) and the extinction coefficient (k) obtained from the modeling are shown in Fig. 7.…”

Section: Optical Propertiesmentioning

confidence: 99%

Atomic layer deposition of molybdenum oxide from (NtBu)2(NMe2)2Mo and O2 plasma

Vos

Macco

Thissen

et al. 2015

Journal of Vacuum Science &Amp; Technology A: Vacuum, Surfaces, and Films

120

View full text Add to dashboard Cite

Molybdenum oxide (MoOx) films have been deposited by atomic layer deposition using bis(tert-butylimido)-bis(dimethylamido)molybdenum and oxygen plasma, within a temperature range of 50–350 °C. Amorphous film growth was observed between 50 and 200 °C at a growth per cycle (GPC) around 0.80 Å. For deposition temperatures of 250 °C and higher, a transition to polycrystalline growth was observed, accompanied by an increase in GPC up to 1.88 Å. For all deposition temperatures the O/Mo ratio was found to be just below three, indicating the films were slightly substoichiometric with respect to MoO3 and contained oxygen vacancies. The high purity of the films was demonstrated in the absence of detectable C and N contamination in Rutherford backscattering measurements, and a H content varying between 3 and 11 at. % measured with elastic recoil detection. In addition to the chemical composition, the optical properties are reported as well.

show abstract

Section: Optical Propertiesmentioning

confidence: 99%

Atomic layer deposition of molybdenum oxide from (NtBu)2(NMe2)2Mo and O2 plasma

Vos

Macco

Thissen

et al. 2015

Journal of Vacuum Science &Amp; Technology A: Vacuum, Surfaces, and Films

120

View full text Add to dashboard Cite

show abstract

“…There is considerable controversy over the assignment of the fundamental optical absorption edge in TiO 2 [17][18][19]. Most of reports assume that TiO 2 thin films have direct or indirect allowed transition [20,21].…”

mentioning

confidence: 99%

Effect of the substrate temperature on the properties of the RF sputtered TiO₂ thin films

Mbarek

Chaabouni

Selmi

et al. 2010

Phys. Status Solidi (c)

View full text Add to dashboard Cite

Titanium dioxide (TiO2) thin films were deposited by RF magnetron sputtering on glass and silicon substrates at different substrate temperatures (20, 100, 200 and 300 °C). The structural and morphological characteristics of the films were investigated by X ray Diffractometry (XRD) and Atomic Force Microscopy (AFM) while the optical properties of the films were studied by optical spectroscopy. It was shown that at room temperature, TiO2 films grown on glass were amorphous following the substrate structure. At higher temperatures, XRD detected only a nanocrystalline rutile TiO2 structure. This indicated that the transition temperature toward the most stable TiO2 phase was obtained from 100 °C and the crystallinity was enhanced at higher growth temperature. For TiO2 films grown on Si substrates, only a nanocrystalline anatase TiO2 structure was obtained at room temperature. At higher temperatures, we noticed the appearance of other secondary phases related to rutile, anatase and brookite structures. From AFM images, we noticed that at room temperature, the films were porous. With increasing the temperature, the structure of the films became crystallized showing a columnar structure. Film growth and structural properties were discussed in terms of the Thornton model. From optical analysis, the films were transparent with an indirect band gap and a refraction index which reached 3.09 eV and 2.7, respectively. The reflectance and transmittance spectra showed, not only that there was a little translation from UVB to UVA and near‐visible range, but also a decrease of reflection with a temperature increase indicating that the films could be used as anti‐reflection coatings. (© 2010 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)

show abstract

“…Therefore the intrinsic stress in the sputtered MoO 3 thin films can be compressive or tensile stress, depending on the mass, flux and energy of the particles striking the film. Mohamed et al [20] found that the stress of -824 MPa at oxygen partial pressure of 3.9x 10 -4 Pa and it decreased sharply with increase oxygen partial pressure. …”

Section: Structure and Surface Morphologymentioning

confidence: 99%

Structural and electrical characterization of magnetron sputtered MoO₃thin films

Nirupama

Sekhar

Subramanyam

et al. 2010

J. Phys.: Conf. Ser.

View full text Add to dashboard Cite

Correlation between structure, stress and optical properties in direct current sputtered molybdenum oxide films

Cited by 92 publications

References 26 publications

Atomic layer deposition of molybdenum oxide from (NtBu)2(NMe2)2Mo and O2 plasma

Atomic layer deposition of molybdenum oxide from (NtBu)2(NMe2)2Mo and O2 plasma

Effect of the substrate temperature on the properties of the RF sputtered TiO₂ thin films

Structural and electrical characterization of magnetron sputtered MoO₃thin films

Contact Info

Product

Resources

About

Correlation between structure, stress and optical properties in direct current sputtered molybdenum oxide films

Cited by 92 publications

References 26 publications

Atomic layer deposition of molybdenum oxide from (NtBu)2(NMe2)2Mo and O2 plasma

Atomic layer deposition of molybdenum oxide from (NtBu)2(NMe2)2Mo and O2 plasma

Effect of the substrate temperature on the properties of the RF sputtered TiO2 thin films

Structural and electrical characterization of magnetron sputtered MoO3thin films

Contact Info

Product

Resources

About

Effect of the substrate temperature on the properties of the RF sputtered TiO₂ thin films

Structural and electrical characterization of magnetron sputtered MoO₃thin films