Corrosion Resistant TiTaN and TiTaAlN Thin Films Grown by Hybrid HiPIMS/DCMS Using Synchronized Pulsed Substrate Bias with No External Substrate Heating

Godoy, Yuri Lizbeth Chipatecua; Tengstrand, Olof; Florez, Jairo Olaya; Petrov, I.; Bustos, Erika; Hultman, Lars; Herrera-Gómez, Alberto; Greene, J. E.; Greczyński, Grzegorz

doi:10.3390/coatings9120841

Cited by 5 publications

(1 citation statement)

References 69 publications

(127 reference statements)

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“…Early examples of advantages offered by a hybrid HiPIMS/DCMS technique with metal-ion-synchronized substrate bias include the use of Ta + ( m Ta = 181.0 amu) or W + HiPIMS ions ( m W = 183.8 amu) to grow dense and hard Ti 1- x-y Al x Ta y N 9 , Ti 1- x Ta x N 8 , or Ti 0.40 Al 0.27 W 0.33 N 17 films at the substrate temperatures not exceeding 150 °C. The high quality of these layers was confirmed by the application studies in which Ti 1- x Ta x N layers performed exceptionally well as Cu diffusion barriers on Si (001) 18 and provided excellent corrosion protection for stainless-steel substrates 19 . Systematic studies of densification effects induced by group VIB transition metal (TM) target ions in Ti 0.50 Al 0.50 N demonstrated that the densification effects scale with the mass of HiPIMS-generated metal-ions 20 .…”

Section: Introductionmentioning

confidence: 84%

Dense, single-phase, hard, and stress-free Ti0.32Al0.63W0.05N films grown by magnetron sputtering with dramatically reduced energy consumption

Bakhit

Johansson-Jöesaar³

et al. 2022

Sci Rep

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The quest for lowering energy consumption during thin film growth, as by magnetron sputtering, becomes of particular importance in view of sustainable development goals. A recently proposed solution combining high power impulse and direct current magnetron sputtering (HiPIMS/DCMS) relies on the use of heavy metal-ion irradiation, instead of conventionally employed resistive heating, to provide sufficient adatom mobility, in order to obtain high-quality dense films. The major fraction of process energy is used at the sputtering sources rather than for heating the entire vacuum vessel. The present study aims to investigate the W+ densification effects as a function of increasing Al content in (Ti1-yAly)1-xWxN films covering the entire range up to the practical solubility limits (y ~ 0.67). Layers with high Al content are attractive to industrial applications as the high temperature oxidation resistance increases with increasing Al concentration. The challenge is, however, to avoid precipitation of the hexagonal wurtzite AlN phase, which is softer. We report here that (Ti1-yAly)1-xWxN layers with y = 0.66 and x = 0.05 grown by a combination of W-HiPIMS and TiAl-DCMS with the substrate bias Vs synchronized to the W+-rich fluxes (to provide mobility in the absence of substrate heating) possess single-phase NaCl-structure, as confirmed by XRD and SAED patterns. The evidence provided by XTEM images and the residual oxygen content obtained from ERDA analyses reveals that the alloy films are dense without discernable porosity. The nanoindentation hardness is comparable to that of TiAlN films grown at 400–500 °C, while the residual stresses are very low. We established that the adatom mobility due to the heavy ion W+ irradiation (in place of resistive heating) enables the growth of high-quality coatings at substrate temperatures not exceeding 130 °C provided that the W+ momentum transfer per deposited metal atom is sufficiently high. The benefit of this novel film growth approach is not only the reduction of the process energy consumption by 83%, but also the possibility to coat temperature-sensitive substrates.

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Section: Introductionmentioning

confidence: 84%

Dense, single-phase, hard, and stress-free Ti0.32Al0.63W0.05N films grown by magnetron sputtering with dramatically reduced energy consumption

Bakhit

Johansson-Jöesaar³

et al. 2022

Sci Rep

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Evaluation of Corrosion Resistance of Thin Films Formed on AISI 316L Steel by Plasma Using Hastelloy as Cathodic Cage

Monção

Júnior

Bandeira

et al. 2021

Physica Status Solidi (a)

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Herein, the use of Hastelloy C-276 as a cathodic cage for the deposition of thin films on the AISI 316L steel substrate by plasma is investigated. The films are processed through floating potential at 350, 375, 400, and 425 C for 4 h, using a hydrogen-nitrogen mixture in the proportion of 40% and 60%, respectively. The thin films are investigated by X-ray diffraction, scanning electron microscopy, Raman spectroscopy, and potentiodynamic polarization. The spectroscopy results point out the formation of different phases such as FeNi 3 , CrNi, and MoN 1/2 . Films acquired at 375 ºC present superior corrosion resistance with less negative corrosion potential (À0.020 V). The increase and decrease in FeNi 3 and CrNi contents follow the improvement of the applied temperature, which is unbeneficial to the corrosion resistance of the films.

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Toward energy-efficient physical vapor deposition: Routes for replacing substrate heating during magnetron sputter deposition by employing metal ion irradiation

Bakhit

Johansson-Jöesaar³

et al. 2021

Surface and Coatings Technology

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Corrosion Resistant TiTaN and TiTaAlN Thin Films Grown by Hybrid HiPIMS/DCMS Using Synchronized Pulsed Substrate Bias with No External Substrate Heating

Cited by 5 publications

References 69 publications

Dense, single-phase, hard, and stress-free Ti0.32Al0.63W0.05N films grown by magnetron sputtering with dramatically reduced energy consumption

Dense, single-phase, hard, and stress-free Ti0.32Al0.63W0.05N films grown by magnetron sputtering with dramatically reduced energy consumption

Evaluation of Corrosion Resistance of Thin Films Formed on AISI 316L Steel by Plasma Using Hastelloy as Cathodic Cage

Toward energy-efficient physical vapor deposition: Routes for replacing substrate heating during magnetron sputter deposition by employing metal ion irradiation

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