2021
DOI: 10.1051/e3sconf/202129504008
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Crack resistance of bismuth ferrite films obtained on a flexible substrate

Abstract: Ultrathin BiOx and FeOx layers were obtained by Atomic Layer Deposition (ALD) on the surface of a flexible Kapton substrate (poly (4,4’-oxydiphenylene-pyromellitimide)) at a temperature of 250 °C. The layer thickness was 50 - 100 nm. Surface morphology, electrical polarization, and mechanical properties were investigated by Atomic Force Microscope, Piezoelectric Force Microscopy and Force Modulation Microscopy. Chemical analysis was performed by X-ray Photoelectron Spectroscopy, where the formation of Bi2O3 an… Show more

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Cited by 2 publications
(1 citation statement)
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“…ALD technology allows for the production of functional layers on surfaces, including polymers [18]. The thinness of the layers allows for a reduction in their crack resistance [19]. Reconfigurable flexoelectricity, caused by bending a flexible substrate, induces non-uniform distortion of the BFO lattice, affecting the inversion asymmetry of the film [20].…”
Section: Introductionmentioning
confidence: 99%
“…ALD technology allows for the production of functional layers on surfaces, including polymers [18]. The thinness of the layers allows for a reduction in their crack resistance [19]. Reconfigurable flexoelectricity, caused by bending a flexible substrate, induces non-uniform distortion of the BFO lattice, affecting the inversion asymmetry of the film [20].…”
Section: Introductionmentioning
confidence: 99%