1996
DOI: 10.1149/1.1837272
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Creation and Properties of Nitrogen Dangling Bond Defects in Silicon Nitride Thin Films

Abstract: The photocreation mechanisms and properties of nitrogen dangling bonds in amorphous hydrogenated silicon nitride (a-SiN:H) thin films are investigated. We find that the photocreation is strongly dependent on film deposition conditions, illumination temperature, and postdeposition thermal treatment. Our results suggest that H largely passivates N dangling bonds and/or precursor sites in the as-deposited films. The N-H bonds can then dissociate by a high-temperature deposition or postdeposition anneal (T> 500°C)… Show more

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Cited by 31 publications
(21 citation statements)
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“…When UV irradiation from the full solar spectrum (or simulator) is introduced, carriers can be generated in the dielectric a ‐SiN x :H, essentially a wide band gap semiconductor with varying range of optical band gap as low as 2.43 eV (510 nm), 31 but observable experimentally in the literature in solar cells below 3.1 eV (400 nm) 5 . These photogenerated electrons can be trapped by K + centers existing in the band gap, neutralizing them 32 . The photo‐excitation process would result in mobile holes in the valence band of the nitride, which can drift toward the module face because of the electric field associated with the remaining K + centers that are concentrated toward the silicon cell.…”
Section: Discussionmentioning
confidence: 99%
See 1 more Smart Citation
“…When UV irradiation from the full solar spectrum (or simulator) is introduced, carriers can be generated in the dielectric a ‐SiN x :H, essentially a wide band gap semiconductor with varying range of optical band gap as low as 2.43 eV (510 nm), 31 but observable experimentally in the literature in solar cells below 3.1 eV (400 nm) 5 . These photogenerated electrons can be trapped by K + centers existing in the band gap, neutralizing them 32 . The photo‐excitation process would result in mobile holes in the valence band of the nitride, which can drift toward the module face because of the electric field associated with the remaining K + centers that are concentrated toward the silicon cell.…”
Section: Discussionmentioning
confidence: 99%
“…5 These photogenerated electrons can be trapped by K + centers existing in the band gap, neutralizing them. 32 The photo-excitation process would result in mobile holes in the valence band of the nitride, which can drift toward the module face because of the electric field associated with the remaining K + centers that are concentrated toward the silicon cell. A band diagram illustrating the process is shown in Figure S2.…”
Section: Pid With Simultaneous Irradiancementioning
confidence: 99%
“…Amorphous Silicon Nitride (a-Si 3 N 4 , or a-SiNx if the alloy is non-stoichiometric) is a very promising materials for application in the field of memory devices 1 and optoelectronics [2][3][4][5][6] . As for optoelectronics, in Si rich a-SiN x samples Si clusters (Si-c) present in the matrix 7 are thought to be responsible for the luminescence of this material.…”
Section: Introductionmentioning
confidence: 99%
“…2,3 However, a-SiN x films are known to be luminescent matrices on their own due to the light emission related to the presence of specific defects. [4][5][6] Si and N related defects act also as charge traps and their high concentration in a-SiN x makes this material suitable for building non-volatile memory devices.…”
Section: Introductionmentioning
confidence: 99%
“…Dangling bonds can be also induced by light as in case of amorphous silica [74][75][76][77][78][79][80]. Moreover, physical etching of other solid compounds rather than covalent compounds may create dangling bonds on their surfaces.…”
mentioning
confidence: 99%