Conspectus
As one of
the most widely used characterization tools in materials
science, (scanning) transmission electron microscopy ((S)TEM) has
the unique ability to directly image specimens with atomic resolution.
Compared to diffraction-based techniques, the main advantage of (S)TEM
imaging is that in addition to the periodic average structures of
crystalline materials, it can be used to probe nonperiodic local structures
such as surfaces, interfaces, dopants, and defects, which have crucial
impacts on material properties. However, many crystalline materials
are extremely sensitive to electron beam irradiation, which can only
withstand dozens (or even fewer) of electrons per square angstrom
before they undergo structural damage. Although using electron doses
lower than the thresholds can in principle preserve their structures,
the thus acquired images are too noisy to be useful. Consequently,
high-resolution imaging of the inherent structures of such electron
beam-sensitive materials using (S)TEM is a long-standing challenge.
In recent years, the advances in electron detectors and image-acquisition
methods have enabled high-resolution (S)TEM with ultralow electron
doses, largely overcoming this challenge. A series of highly electron
beam-sensitive materials that are traditionally considered impossible
to be imaged with (S)TEM, including metal organic frameworks (MOFs),
covalent organic frameworks (COFs), organic–inorganic hybrid
halide perovskites, and supramolecular crystals, have been successfully
imaged at atomic resolutions. This technological advance has greatly
expanded the application range of electron microscopy.
This
Account focuses on our recent works pertaining to the high-resolution
imaging of electron beam-sensitive materials using very low electron
doses. We first explain that the use of direct-detection electron-counting
(DDEC) cameras provides the hardware basis for successful low-dose
high-resolution TEM (HRTEM). Subsequently, we introduce a suite of
methods to address the challenges peculiar to low-dose HRTEM, including
rapid search for crystal zone axes, precise alignment of the image
stack, and accurate determination of the defocus value. These methods,
combined with the use of a DDEC camera, ensure efficient imaging of
electron beam-sensitive crystalline materials in the TEM mode. Moreover,
we demonstrate that integrated differential phase contrast STEM (iDPC-STEM)
is an effective method for acquiring directly interpretable atomic-resolution
images under low-dose conditions. In addition, we share our views
on the great potential of four-dimensional STEM (4D-STEM) in imaging
highly electron beam-sensitive materials and provide preliminary simulation
results to demonstrate its feasibility. Finally, we discuss the significance
of developing (S)TEM specimen preparation techniques applicable for
sensitive materials and the advantages of using the cryogenic focused
ion beam (cryo-FIB) technique for this purpose.