2022
DOI: 10.21883/tpl.2022.11.54889.19350
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Criterion for the growth selectivity of III-V and III-N nanowires on masked substrates

Abstract: A model is developed for the initial stage of nucleation of III-V nanowires including nitrides (III-V NWs) and other nanostructures grown by selective area epitaxy on masked substrates with regular arrays of pinholes. A criterion for the growth selectivity is obtained, which ensures nucleation of III-V NWs within the pinholes but not on a mask surface. The temperature, group III and V fluxes, pinhole radius and pitch dependences of the selective growth zones are analyzed Keywords: III-V nanowires, selective ar… Show more

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“…Consequently, a higher degree of similarity in the morphology is found, although NWs are not all identical in length and diameter. 30,192 Surprisingly, recent works indicate that the electrical properties may also vary considerably in wellordered arrays.…”
Section: The Challenge Of Scalabilitymentioning
confidence: 99%
“…Consequently, a higher degree of similarity in the morphology is found, although NWs are not all identical in length and diameter. 30,192 Surprisingly, recent works indicate that the electrical properties may also vary considerably in wellordered arrays.…”
Section: The Challenge Of Scalabilitymentioning
confidence: 99%