A new dopant incorporation mechanism in Ga-assisted GaAs nanowires grown by molecular beam epitaxy is reported. Off-axis electron holography revealed that p-type Be dopants introduced in situ during molecular beam epitaxy growth of the nanowires were distributed inhomogeneously in the nanowire cross-section, perpendicular to the growth direction. The active dopants showed a remarkable azimuthal distribution along the (111)B flat top of the nanowires, which is attributed to preferred incorporation along 3-fold symmetric truncated facets under the Ga droplet. A diffusion model is presented to explain the unique radial and azimuthal variation of the active dopants in the GaAs nanowires.
The ability to grow defect-free nanowires in lattice-mismatched material systems and to design their properties has made them ideal candidates for applications in fields as diverse as nanophotonics, nanoelectronics and medicine. After studying nanostructures consisting of elemental and binary compound semiconductors, scientists turned their attention to more complex systems—ternary nanowires. Composition control is key in these nanostructures since it enables bandgap engineering. The use of different combinations of compounds and different growth methods has resulted in numerous investigations. The aim of this review is to present a survey of the material systems studied to date, and to give a brief overview of the issues tackled and the progress achieved in nanowire composition tuning. We focus on ternary III
x
III1−x
V nanowires (AlGaAs, AlGaP, AlInP, InGaAs, GaInP and InGaSb) and IIIV
x
V1−x
nanowires (InAsP, InAsSb, InPSb, GaAsP, GaAsSb and GaSbP).
Patterned arrays of self-assisted GaP nanowires (NWs) were grown on a Si substrate by gas source molecular beam epitaxy using various V/III flux ratios from 1-6, and various pitches from 360-1000 nm. As the V/III flux ratio was increased from 1-6, the NWs showed a change in morphology from outward tapering to straight, and eventually to inward tapering. The morphologies of the self-assisted GaP NWs are well described by a simple kinetic equation for the NW radius versus the position along the NW axis. The most important growth parameter that governs the NW morphology is the V/III flux ratio. Sharpened NWs with a stable radius equal to only 12 nm at a V/III flux of 6 were achieved, demonstrating their suitability for the insertion of quantum dots.
The
nanowire geometry
is favorable for the growth of ternary semiconductor
materials, because the composition and properties can be tuned freely
without substrate lattice matching. To achieve precise control of
the composition in ternary semiconductor nanowires, a deeper understanding
of the growth is required. One unknown aspect of seeded nanowire growth
is how the composition of the catalyst nanoparticle affects the resulting
composition of the growing nanowire. We report the first
in
situ
measurements of the nanoparticle and In
x
Ga
1–
x
As nanowire
compositional relationship using an environmental transmission electron
microscopy setup. The compositions were measured and correlated during
growth, via X-ray energy dispersive spectroscopy. Contrary to predictions
from thermodynamic models, the experimental results do not show a
miscibility gap. Therefore, we construct a kinetic model that better
predicts the compositional trends by suppressing the miscibility gap.
The findings imply that compositional control of In
x
Ga
1–
x
As nanowires is possible
across the entire compositional range.
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