2014
DOI: 10.1364/oe.22.017370
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Critical dimension measurement of transparent film layers by multispectral imaging

Abstract: An optical microscopy system as a non-destructive method for measuring critical dimension (CD) is widely used for its stability and fastness. In case of transparent thin film measurement, it is hard to recognize the pattern under white light illumination due to its transparency and reflectance characteristics. In this paper, the optical measurement system using multispectral imaging for CD measurement of transparent thin film is introduced. The measurement system utilizes an Acousto-Optic Tunable Filter (AOTF)… Show more

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Cited by 9 publications
(2 citation statements)
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“…New approaches by many research groups have been developed to measure the spatially resolved thickness and refractive index of thin film by analyzing self-interference using a spectroscopic imaging reflectometer [8][9][10][11][12][13]. In a spectroscopic imaging reflectometer, to obtain a stack of multispectral…”
Section: Introductionmentioning
confidence: 99%
“…New approaches by many research groups have been developed to measure the spatially resolved thickness and refractive index of thin film by analyzing self-interference using a spectroscopic imaging reflectometer [8][9][10][11][12][13]. In a spectroscopic imaging reflectometer, to obtain a stack of multispectral…”
Section: Introductionmentioning
confidence: 99%
“…The measurement of volumetric thickness using a CCD camera as a spectrum detector has been studied recently [5][6][7][8][9][10][11][12]. It is often called imaging spectroscopic reflectometry (ISR) when the volumetric thickness is measured by SR theory [8,9].…”
Section: Introductionmentioning
confidence: 99%