Cross‐Scale Topography Achieved by MOPL with Positive Photoresist to Regulate the Cell Behavior

Abstract

Cross‐scale micro‐nano structures play an important role in semiconductors, MEMS, chemistry, and cell biology. Positive photoresist is widely used in lithography due to the advantages of high resolution and environmental friendliness. However, cross‐scale micro‐nano structures of positive photoresist are difficult to flexibly pattern, and the feature resolution is limited by the optical diffraction. Here, cross‐scale patterned micro‐nano structures are achieved using the positive photoresist based on the femtosecond laser maskless optical projection lithography (MOPL) technique. The dependence between exposure dose and groove width is comprehensively analyzed, and a feature size of 112 nm is obtained at 110 µW. Furthermore, large‐area topography considering cell size is efficiently fabricated by the MOPL technique, which enables the regulation of cell behavior. The proposed protocol of achieving cross‐scale structures with the exact size by MOPL of positive photoresist would provide new avenues for potential applications in nanoelectronics and tissue engineering.

Multipatterned Chondrocytes’ Scaffolds by FL-MOPL with a BSA-GMA Hydrogel to Regulate Chondrocytes’ Morphology

“…In recent years, various microfabrication techniques such as soft lithography, electron beam lithography, and femtosecond laser direct writing − have been used to fabricate arbitrary high-precise nanostructures, but they are inefficient in fabricating large-area cross-scale micronano structures. , UV lithography and nanoimprinting techniques can be used for the high-throughput fabrication of micronano structures, but these techniques require specific masks and lack flexibility. Femtosecond laser maskless optical projection lithography (FL-MOPL) is a powerful technology for fabricating high-precision and high-efficiency large-area micronano structures, which employs digital micromirror device (DMD) as a digital mask and is capable of simultaneously processing multiple pixel sites. − …”

Exceptional Lithography Sensitivity Boosted by Hexafluoroisopropanols in Photoresists

“…Researchers have recently developed a variety of candidate photoresist materials, including chemically amplified photoresists (CARs) [ 10 , 11 , 12 ], metal-based materials [ 13 , 14 ], and cleavage polymer-based non-CARs [ 15 , 16 , 17 ]. Of these, polymer-based CARs are considered the latest qualifying EUV photoresist for realizing high-volume manufacturing [ 18 ].…”