Crosslinked Organosilicon-Acrylate Copolymer Moisture Barrier Thin Film Fabricated by Initiated Chemical Vapor Deposition (iCVD)

Seok, Ji-Hoo; Kim, Sung Hee; Cho, Sung Min; Yi, Gi‐Ra; Lee, Jun Young

doi:10.1007/s13233-019-6149-2

Cited by 13 publications

(8 citation statements)

References 31 publications

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“…To address this limitation and potentially further improve performance, copolymerization of V4D4 will be an important strategy to tune film composition and properties. Copolymerization of V4D4 with various classes of comonomers is a straightforward, well-established exercise in iCVD; several copolymers incorporating V4D4 have been reported in the literature ( 49 , 50 ). For future SEI studies, anionic comonomers can be incorporated to coordinate Li + , perfluorinated comonomers can be used to lower the surface energy of the film and modulate the SEI composition, or enumerable other monomers can be used to tune the network microstructure and physical properties of the film.…”

Section: Discussionmentioning

confidence: 99%

Ultrathin conformal polycyclosiloxane films to improve silicon cycling stability

2019

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Electrochemical reduction of lithium ion battery electrolyte on Si anodes was mitigated by synthesizing nanoscale, conformal polymer films as artificial solid electrolyte interface (SEI) layers. Initiated chemical vapor deposition (iCVD) was used to deposit poly(1,3,5,7-tetravinyl-1,3,5,7-tetramethylcyclotetrasiloxane) (pV4D4) onto silicon thin film electrodes. pV4D4 films (25 nm) on Si electrodes improved initial coulombic efficiency by 12.9% and capacity retention over 100 cycles by 64.9% relative to untreated electrodes. pV4D4 coatings improved rate capabilities, enabling higher lithiation capacity at all current densities. Impedance spectroscopy showed that SEI resistance grew from 50 to 191 ohms in untreated Si and only 34 to 90 ohms in pV4D4-coated Si over 30 cycles. Post-cycling Fourier transform infrared and x-ray photoelectron spectroscopy showed that pV4D4 moderated electrolyte reduction and altered SEI composition, with LiF formation being favored. This work will guide further development of polymeric artificial SEIs to mitigate electrolyte reduction and enhance capacity retention in Si electrodes.

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Section: Discussionmentioning

confidence: 99%

Ultrathin conformal polycyclosiloxane films to improve silicon cycling stability

2019

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“…112,119 Copolymerization of V4D4 and cyclohexylmethacrylate yielded a smooth, transparent iCVD film with moisture barrier properties of interest for electronics protection. 120 The PFDA and 1H,1H,2H,2H-perfluorodecyl methacrylate (PFDMA) monomers both possess a C8 [-(CF2)8F] pendent chain. Additionally, PFDMA has a bulky α-methyl group, leading to films displaying higher glass transition temperatures (Tg).…”

Section: Hydrophobic Surfacesmentioning

confidence: 99%

Nanoscale control by chemically vapour-deposited polymers

Gleason

2020

Nat Rev Phys

104

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“…During iCVD, the monomer molecules are concentrated on the cooled surface within a liquid‐like thin layer. In a copolymerization, the concentration of each comonomer in this layer can affect the deposition kinetics 37,38 . In our case, the introduction of EGDMA decrease the concentration of EHA significantly in this layer considering its much lower vapor pressure with respect to EHA.…”

Section: Resultsmentioning

confidence: 67%

Vapor deposition of stable copolymer thin films in a batchiCVDreactor

Yılmaz

Şakalak

Gürsoy

et al. 2020

J of Applied Polymer Sci

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This study demonstrates the deposition of poly(ethylhexyl acrylate-co-ethylene glycol dimethacrylate) (P(EHA-co-EGDMA)) copolymer thin films in a batch type initiated chemical vapor deposition (iCVD) reactor. Crosslinked copolymers are desired for many applications because of their high stable properties. iCVD polymers derived by monomers bearing only one vinyl bond are usually linearly structured polymers and hence they are not durable, which is unfavorable for many real-world applications. Robust crosslinked iCVD films can be produced with the help of crosslinkers. In a typical iCVD process, copolymer thin film is produced by constantly feeding monomer vapor and crosslinker into the reactor. The monomer/crosslinker ratio should be precisely controlled for fabrication of reproducible thin films. In order to eliminate problems caused by adjusting the flowrates of precursors, a closed-batch type iCVD reactor was used for the first time in this study to produce copolymer thin films. The variation of precursors' partial pressures allowed control over the copolymer thin film structures. As compared with homopolymer, copolymers showed the better chemical and thermal stable properties. Almost 40% of the copolymer thin film remained on the substrate surface at an annealing temperature of 300 C, whereas the homopolymer film was completely removed at an annealing temperature of 280 C.

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Crosslinked Organosilicon-Acrylate Copolymer Moisture Barrier Thin Film Fabricated by Initiated Chemical Vapor Deposition (iCVD)

Cited by 13 publications

References 31 publications

Ultrathin conformal polycyclosiloxane films to improve silicon cycling stability

Ultrathin conformal polycyclosiloxane films to improve silicon cycling stability

Nanoscale control by chemically vapour-deposited polymers

Vapor deposition of stable copolymer thin films in a batchiCVDreactor

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