The magnetic order in antiferromagnetic materials is hard to control with external magnetic fields. Using X-ray Magnetic Linear Dichroism microscopy, we show that staggered effective fields generated by electrical current can induce modification of the antiferromagnetic domain structure in microdevices fabricated from a tetragonal CuMnAs thin film. A clear correlation between the average domain orientation and the anisotropy of the electrical resistance is demonstrated, with both showing reproducible switching in response to orthogonally applied current pulses. However, the behavior is inhomogeneous at the submicron level, highlighting the complex nature of the switching process in multi-domain antiferromagnetic films.Antiferromagnetic (AF) materials are of increasing interest both for fundamental physics and applications. Recent advances in detecting and manipulating AF order electrically have opened up new prospects for these materials in basic and applied spintronics research [1][2][3][4][5][6][7]. Of particular interest is the Néel order spin-orbit torque (NSOT) [6], recently demonstrated in the collinear AF CuMnAs [7], where a current-induced local spin polarization can exert a rotation of the magnetic sublattices. NSOT is closely analogous to the spin-orbit torque in ferromagnets with broken inversion symmetry, in which electrical currents induce effective magnetic fields that can be used to switch the magnetization direction [8,9]. The tetragonal CuMnAs lattice [10] is inversion symmetric, so that zero net spin polarization is generated by a uniform electric current. However, its Mn spin sublattices form inversion partners, resulting in local effective fields of opposite sign on the AF-coupled Mn sites [6,11]. These staggered current-induced fields can be large enough to cause a non-volatile rotation of the AF spin axis [7].Current-induced rotations of AF moments can be detected electrically using anisotropic magnetoresistance (AMR), a dependence on the relative orientation of the current and spin axes which is present in both ferromagnetic and AF materials [12][13][14][15]. This provides only spatially averaged information over the probed area of the device, which may be several microns or larger. PhotoEmission Electron Microscopy (PEEM), with contrast enabled by X-ray Magnetic Linear Dichroism (XMLD), provides direct imaging of AF domains with better than 100 nm resolution [16]. Based on differences in absorption of x-rays with linear polarization, XMLD-PEEM has offered valuable insights into the microscopic magnetic properties of AF films [17] and ferromagnet / AF interfaces [18,19]. The measured intensity varies as I 0 + I 2 cos 2 α, where α is the angle between the x-ray polarization and the spin axis [20], so is equally present for AF and FM materials, similar to AMR. The XMLD amplitude given by I 2 also depends on the orientation of the x-ray polarization with respect to the crystalline axes [21,22], and the signal is sensitive to domains within the top few nanometers of the surface.Here, we combin...