Cryogenic characterization of titanium nitride thin films

Vertchenko, Larissa; Leandro, Lorenzo; Shkondin, Evgeniy; Takayama, Osamu; Bondarev, I. V.; Akopian, N.; Lavrinenko, Andrei V.

doi:10.1364/ome.9.002117

Cited by 25 publications

(34 citation statements)

References 33 publications

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“…The plasma frequency is measured by ellipsometry at room temperature, the coherence length is determined using the relation (ξ 0 ) 2 = −Φ 0 (dB c2 /dT ) −1 /2πT c from the temperature dependencies of the second critical magnetic field B c2 (T ), see the Figure 4(c). The transport relaxation time is estimated as τ tr = 1/(ρ 10K ω 2 p ε 0 ), assuming that ω p is temperature independent [46]. Note that in our analysis of the size-effect in the residual resistance we excluded the Mayadas-Shatzkes (MS) model [47], which focuses on the scattering of electrons at grain boundaries in polycrystalline thin films.…”

Section: Resultsmentioning

confidence: 99%

Superconductivity Behavior in Epitaxial TiN Films Points to Surface Magnetic Disorder

et al. 2019

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We analyze the evolution of the normal and superconducting electronic properties in epitaxial TiN films, characterized by high Ioffe-Regel parameter values, as a function of the film thickness. As the film thickness decreases, we observe an increase of the residual resistivity, which becomes dominated by diffusive surface scattering for d ≤ 20 nm. At the same time, a substantial thicknessdependent reduction of the superconducting critical temperature is observed compared to the bulk TiN value. In such a high quality material films, this effect can be explained by a weak magnetic disorder residing in the surface layer with a characteristic magnetic defect density of ∼ 10 12 cm −2 . Our results suggest that surface magnetic disorder is generally present in oxidized TiN films. arXiv:1903.05009v3 [cond-mat.mtrl-sci]

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Section: Resultsmentioning

confidence: 99%

Superconductivity Behavior in Epitaxial TiN Films Points to Surface Magnetic Disorder

et al. 2019

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“…(1). For metals at frequencies below the interband transition frequencies, ε is known to be ∼ 10 in magnitude, being contributed both by the positive background of ions and by the interband transitions to some extent [19,26]. Under continuous low-intensity light illumination the plasmonic film can still be treated as being at the thermal equilibrium.…”

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confidence: 99%

“…Within its applicability domain, Eq. (3) can be used to obtain ε and/or k c with C being treated as a parameter to fit experimental data in terms of the standard local Drude model, which is typically the case in relevant experiments [4,26].…”

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Transdimensional epsilon-near-zero modes in planar plasmonic nanostructures

Bondarev

Mousavi

Shalaev

2020

Phys. Rev. Research

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We use quantum electrodynamics and the confinement-induced nonlocal dielectric response model based on the Keldysh-Rytova electron interaction potential to study the epsilon-near-zero modes of metallic films in the transdimensional regime. New peculiar effects are revealed such as the plasmon mode degeneracy lifting and the dipole emitter coupling to the split epsilon-near-zero modes, leading to biexponential spontaneous decay with up to three-orders-of-magnitude increased rates.Transdimensional (TD) materials are ultrathin planar nanostructures composed of a precisely controlled finite number of monolayers [1]. Modern material fabrication techniques allow one to produce stoichiometrically perfect films of metals and semiconductors down to a few, or even a single monolayer in thickness [2][3][4][5][6]. TD materials make it possible to probe fundamental properties of light-matter interactions as they evolve from a single atomic layer to a larger number of layers approaching the bulk material properties. The current research has been largely focusing on either purely 2D structures including metal-dielectric interfaces and novel 2D materials [7,8], or on conventional bulk materials, being guided by the traditional view that only the dimensionality and chemical composition are important to control the optoelectronic properties of materials. The transitional, transdimensional regime laying in between 3D and 2D, has been largely out of the major research focus so far.Ultrathin films made of metals, doped semiconductors, or polar materials with a thickness of only a few atomic layers, can support plasmon-, exciton-, and phonon-polariton eigenmodes [6][7][8][9][10][11][12][13]. Such TD materials are therefore expected to show the high tailorability of their electronic and optical properties by varying their thickness (number of monolayers), chemical, atomic and electronic composition (stoichiometry, doping) as opposed to conventional thin films usually described by the bulk material properties with boundary conditions imposed. Plasmonic TD materials (ultrathin finite-thickness metallic films), in particular, can provide controlled light confinement due to their thicknessdependent localized surface plasmon (SP) modes [12,13], thereby offering tunable light-matter coupling, higher adjustable transparency and new quantum phenomena such as enabling atomic transitions that are normally forbidden [14]. Similar to truly 2D and quasi-2D materials such as graphene and transition metal dichalcogenide monolayers [8,15], plasmonic TD materials are also expected to show the extreme sensitivity to external fields, making possible advances such as novel parity-time symmetry * Corresponding author email: ibondarev@nccu.edu breaking photonic designs [16] that can further develop the fields of plasmonics and optical metasurfaces [17,18]. However, while some predictions on tunability, anomalous dispersion, and strong light confinement in ultrathin plasmonic films have been made [19][20][21][22][23] much remains unclear about their nonlinea...

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“…The measured FTIR reflection and fitted reflection spectra by using the RefFit software 44,74,75 are shown in Fig. 3 and supplementary material at [URL will be inserted by AIP Publishing].…”

Section: Optical Properties/permittivitiesmentioning

confidence: 99%

Thickness-dependent optical properties of aluminum nitride films for mid-infrared wavelengths

Beliaev

Shkondin

Lavrinenko

et al. 2021

Journal of Vacuum Science &Amp; Technology A: Vacuum, Surfaces, and Films

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Cryogenic characterization of titanium nitride thin films

Cited by 25 publications

References 33 publications

Superconductivity Behavior in Epitaxial TiN Films Points to Surface Magnetic Disorder

Superconductivity Behavior in Epitaxial TiN Films Points to Surface Magnetic Disorder

Transdimensional epsilon-near-zero modes in planar plasmonic nanostructures

Thickness-dependent optical properties of aluminum nitride films for mid-infrared wavelengths

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