2022
DOI: 10.1109/ted.2022.3175675
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Cryogenic Quasi-Ballistic Transport Enhanced by Strained Silicon Technologies in 14-nm Complementary Fin Field Effect Transistors Through Virtual Source Model

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Cited by 3 publications
(1 citation statement)
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“…In the case of long-and midchannel, the DIBL was lower at 77 K compared to 300 K because the effective channel length increased due to the influence of surface potential at cryogenic temperatures [22]. Additionally, the carrier became difficult to overcome the channel energy barrier between the source and drain due to the reduced thermionic emission at cryogenic temperatures [23].…”
Section: Drain-induced Barrier Loweringmentioning
confidence: 99%
“…In the case of long-and midchannel, the DIBL was lower at 77 K compared to 300 K because the effective channel length increased due to the influence of surface potential at cryogenic temperatures [22]. Additionally, the carrier became difficult to overcome the channel energy barrier between the source and drain due to the reduced thermionic emission at cryogenic temperatures [23].…”
Section: Drain-induced Barrier Loweringmentioning
confidence: 99%