Crystalline Structure Changes of Molybdenum Silicide Films Deposited by Sputtering and by Coevaporation after Isochronal Annealing

Abstract

Crystalline structure changes of molybdenum silicide films after isochronal annealing are studied by x-ray and transmission electron microscopy. Two types of films deposited by sputtering from a hot pressed MoSi2 source and coevaporation of molybdenum and silicon, with controlled stoichiometry of MoSi2, are prepared. For both types of depositions, the films that are as-deposited and annealed at temperatures below 350~ are amorphous, but those annealed between 400 ~ and 600~ show hexagonal MoSi2. Transformation from hexagonal to tetragonal MoSi~ occurs above 700~ for the coevaporated film, whereas it proceeds gradually above 800~ for the sputtered film. A carbon stabilized phase SiaMo5 is observed above 750~ for the sputtered film, which suggests that the sputtered film is contaminated by carbon during the deposition. Formation of the Mo-rich silicides Mo3Si2 and Si3Mo5 above 700~ is evidence that the deposited films become Mo-rich during the annealing due to slight oxidation of the film surface. ) unless CC License in place (see abstract). ecsdl.org/site/terms_use address. Redistribution subject to ECS terms of use (see 128.114.34.22 Downloaded on 2014-11-04 to IP ) unless CC License in place (see abstract). ecsdl.org/site/terms_use address. Redistribution subject to ECS terms of use (see 128.114.34.22 Downloaded on 2014-11-04 to IP

Forensic science

“…AES was used to determine the in-depth composition of niobium nitride formed by laser annealing of niobium metal immersed in liquid nitrogen (652). The properties of molybdenum silicide films for very large integrated circuit use were measured (427,674,827,882,979). The XPS spectrum and band structure of RuC13 were reported (601).…”