2010
DOI: 10.1007/s10854-010-0271-z
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Cu–In intermetallic compound inks for CuInS2 solar cells

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Cited by 10 publications
(19 citation statements)
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“…Recently a lot of research was conducted on preparation methods using bimetallic CuIn nanoparticles for roll-to-roll processing of copper indium diselenide (CISe) solar cell absorbers [3][4][5][6][7]. Efficiencies of cells processed by this route range from 1.43% [3] to 7% [4].…”
Section: Introductionmentioning
confidence: 99%
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“…Recently a lot of research was conducted on preparation methods using bimetallic CuIn nanoparticles for roll-to-roll processing of copper indium diselenide (CISe) solar cell absorbers [3][4][5][6][7]. Efficiencies of cells processed by this route range from 1.43% [3] to 7% [4].…”
Section: Introductionmentioning
confidence: 99%
“…Efficiencies of cells processed by this route range from 1.43% [3] to 7% [4]. However, for CISe thin-film solar cells the ratio of elements within the absorber layer is a critical point.…”
Section: Introductionmentioning
confidence: 99%
“…The NaBH 4 -assisted chemical reduction method has been utilized to synthesize nanosized metals effectively [15,16]. Cu-In alloys have been synthesized via NaBH 4 -assisted chemical reduction method [17,18]. It is worth mentioning that the study concerning the selenization reaction of CuInSe 2 films employing Cu-In alloys has not yet been investigated in detail.…”
Section: Introductionmentioning
confidence: 99%
“…The inks were prepared by dissolving Cu-In metal nanoparticles and PVP (k = 30) in ethanol, then were drop-coated on silicon and glass to fabricate precursor films. The Cu/In ratio of precursor films was approximately 1.1:1 [21,22].…”
Section: Methodsmentioning
confidence: 99%
“…In our work, Cu-In metal precursor films have been prepared by a simple non-vacuum method according to our previous reported work [21,22]. We have also reported on the preparation of CuInS 2 thin films and devices using Cu-In metal inks sulphurised in elemental sulfur.…”
Section: Introductionmentioning
confidence: 99%