2008
DOI: 10.1063/1.2936279
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Cubic GaN∕AlN multiple quantum well photodetector

Abstract: Articles you may be interested inCorrelation between the performance of double-barrier quantum-well infrared photodetectors and their microstructure: On the origin of the photovoltaic effect J. Appl. Phys. 98, 044510 (2005); 10.1063/1.2006990 GaN/AlN-based quantum-well infrared photodetector for 1.55 μm Appl. Phys. Lett. 83, 572 (2003); 10.1063/1.1594265 Infrared optical absorbance of intersubband transitions in GaN/AlGaN multiple quantum well structures

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Cited by 24 publications
(11 citation statements)
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“…The GaN/AlN conduction band offset in Γ valley (minimum) was taken as ΔE c = 1.6eV [5,7]. We used pure GaN as the well material and Al x Ga 1-x N as the barrier and embedded layer material.…”
Section: Numerical Resultsmentioning
confidence: 99%
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“…The GaN/AlN conduction band offset in Γ valley (minimum) was taken as ΔE c = 1.6eV [5,7]. We used pure GaN as the well material and Al x Ga 1-x N as the barrier and embedded layer material.…”
Section: Numerical Resultsmentioning
confidence: 99%
“…Besides their application in devices operating on the basis of interband transitions (laser and light emitting diodes in blue-green and ultraviolet spectral range [1][2][3]), electronic and optical properties of GaN and related materials make them particularly suitable for intersubband (ISB) based devices. Due to large values of the conduction band discontinuity and very short ISB absorption recovery times measured in femtoseconds, GaN/Al(Ga)N planar nanostructures are becoming the foremost system for ISB devices operating at telecommunication wavelengths, such as fast multiple quantum well (QW) photodetectors or modulators [4][5][6][7][8]. On the other hand, by changing the QW thickness and Al molar fraction in AlGaN alloy it is possible to tune the ISB absorption peak wavelength to mid-infrared (mid-IR) or terahertz (THz) spectral range, as well [5,[9][10][11].…”
Section: Introductionmentioning
confidence: 99%
“…Among them, traditional c-plane AlGaN/GaN multiple quantum wells (MQWs) structures are widely used. However, the polarization induced internal electric field reduces not only the ISB transition probability but also the photocurrent transportation, which significantly reduces the devices' performance.Some groups eliminated the influence of internal electric field by non-polar GaN based quantum structures [1] and cubic ones [2] . To overcome the poor growth quality of samples in these methods, we use step quantum wells (SQWs) structure in which the internal electric field is proved almost completely eliminated.…”
mentioning
confidence: 99%
“…Some groups eliminated the influence of internal electric field by non-polar GaN based quantum structures [1] and cubic ones [2] . To overcome the poor growth quality of samples in these methods, we use step quantum wells (SQWs) structure in which the internal electric field is proved almost completely eliminated.…”
mentioning
confidence: 99%
“…For optoelectronic applications, it is, therefore, desirable to reduce the internal electric field. This can be achieved by using III-nitride materials synthesized in the cubic phase [13][14][15][16] or by changing the growth direction to set the polarization vector at 90 . 17 The later strategy has been implemented using nonpolar growth planes, namely, the m-plane f10 10g 18 or the a-plane f11 20g.…”
mentioning
confidence: 99%