2015 IEEE 27th International Symposium on Power Semiconductor Devices &Amp; IC's (ISPSD) 2015
DOI: 10.1109/ispsd.2015.7123384
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Current-collapse-free operations up to 850 V by GaN-GIT utilizing hole injection from drain

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Cited by 132 publications
(54 citation statements)
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“…The GaN GIT adopts p-GaN with recessed gate to achieve normally-off. The Hybrid Drain embedded in the GIT (HD-GIT) allows the device to overcome the current collapse [14].…”
Section: Comparing Gate Drive Methods For Driving Gan Gitmentioning
confidence: 99%
“…The GaN GIT adopts p-GaN with recessed gate to achieve normally-off. The Hybrid Drain embedded in the GIT (HD-GIT) allows the device to overcome the current collapse [14].…”
Section: Comparing Gate Drive Methods For Driving Gan Gitmentioning
confidence: 99%
“…Panasonic also uses a p-doped layer of GaN in their latest x-GaN Gate Injection Transistors (GITs), although an earlier version of the GIT used p-doped AlGaN rather than GaN as shown in Fig. 8 (b) [33], [43]. One key difference between these two methods is the forward voltage drop on the gate before steady-state gate current begins to flow, which may be due to the etching depth beneath the p-doped GaN layer.…”
Section: Enhancement-mode Devicesmentioning
confidence: 99%
“…It is worth noticing that through proper optimization of the growth parameters, and through the use of specific device structures, it is possible to completely suppress current collapse in GaN HEMTs with p-GaN gate. Kaneko et al [39] recently proposed to use hole injection from the drain to compensate the trapped electrons, thus eliminating the current collapse. …”
Section: Charge Trapping Processes Related To the P-gan Gatementioning
confidence: 99%