2006
DOI: 10.1088/0953-2048/19/3/020
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Current status and future prospect of the Nb-based fabrication process for single flux quantum circuits

Abstract: The Superconductivity Research Laboratory has successfully fabricated large quantities of single flux quantum (SFQ) large scale integrated circuits, including several thousands of Josephson junctions (JJs). Using a J c = 2.5 kA cm −2 process in which the number of Nb layers was four and the minimum JJ size was 2 µm square. We developed a new advanced fabrication process that produced a J c = 10 kA cm −2 , nine Nb layers and a minimum JJ size of 1 µm square. The increase in the number of Nb layers was achieved … Show more

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Cited by 59 publications
(42 citation statements)
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“…Both regions would have transmitted the singleparticle current, but only the thinner region would have carried the subgap current due to its higher transparency. This transparency can be derived from (2). It is about 0.2 from theoretical prediction for [10]) and almost independent of the measured current density.…”
Section: A Relative Current Step Heightmentioning
confidence: 67%
See 3 more Smart Citations
“…Both regions would have transmitted the singleparticle current, but only the thinner region would have carried the subgap current due to its higher transparency. This transparency can be derived from (2). It is about 0.2 from theoretical prediction for [10]) and almost independent of the measured current density.…”
Section: A Relative Current Step Heightmentioning
confidence: 67%
“…Using this simple method, we can derive the current density of an NbN tunnel junction with a thinner barrier by using (1) and (2). Equation (1) implies that the "average" transparency can be calculated from those of the thicker and thinner regions and it increases with the current density.…”
Section: A Relative Current Step Heightmentioning
confidence: 99%
See 2 more Smart Citations
“…In the AIST STP 2.5-kA/cm 2 [18], [19] and ADP2 10-kA/cm 2 processes [20], [21], the resistive layer RES1 is sandwiched inside isolation layer GC, which also separates the first metal layer/base electrode (BAS, or the M1 layer) from ground (GP, or the M0 layer). In layout, a via on layer GC connects BAS to GP, whereas a contact hole specified on layer RC connects BAS to RES1 through a part of the GC isolation.…”
Section: B Resistive Layer Supportmentioning
confidence: 99%