2019
DOI: 10.1016/j.mssp.2018.12.035
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CVD growth of monolayer WS2 through controlled seed formation and vapor density

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Cited by 36 publications
(26 citation statements)
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“…The synthesis of monolayer WS 2 was achieved via AP-CVD method. [45] 50 mg of WO 3 precursor was placed in a ceramic boat at the center of the single-zone tube furnace. Double side polished sapphire substrates were placed on the ceramic boat.…”
Section: Chemical Vapor Deposited Growth Of Transition Metal Dichalcomentioning
confidence: 99%
“…The synthesis of monolayer WS 2 was achieved via AP-CVD method. [45] 50 mg of WO 3 precursor was placed in a ceramic boat at the center of the single-zone tube furnace. Double side polished sapphire substrates were placed on the ceramic boat.…”
Section: Chemical Vapor Deposited Growth Of Transition Metal Dichalcomentioning
confidence: 99%
“…We utilize WO3 (Sigma-Aldrich, 99.5%) and sulfur (Sigma-Aldrich, 99.5%) as precursors and use N2 gas as a carrier. Also, we make use of H2 for its promoting effect [29]. We change the position of the furnace at 820°C and introduce WO3 to react with sulfur.…”
Section: Methodsmentioning
confidence: 99%
“…In the literature, the Raman spectra of the monolayer WS2 have already been reported showing that calculating the difference between the first-order modes at the Brillouin zone center (E′ and A1) is a powerful tool to identify the number of layers of 2D WS2. If the difference between E′-A1 is lower than 64.5, the flakes are accepted as monolayers [29,31]. For this reason, in the study, we mainly focus on E′ and A1 modes (Figure 3b-d).…”
Section: Methodsmentioning
confidence: 99%
“…Compared to MoS 2 , WS 2 is distinguished by superior carrier mobility and a strong photoluminescent response [30]. However, tungsten reacts less readily with chalcogen atoms compared to molybdenum, so in general tungsten TMD growths tend to lag behind their molybdenum counterparts [31]. Using a modified version of their MoS 2 growth protocol, Kang et al [27] were able to achieve 10 cm diameter films of monolayer WS 2 .…”
Section: Metal Organic Chemical Vapor Deposition (Mocvd)mentioning
confidence: 99%