CVD SiN/sub X/ anti-reflective coating for sub-0.5 μm lithography

Ong, T. P.; Roman, Bernard J.; Paulson, W. M.; Lin, Jane; King, Charles F.; Hayden, J.D.; Ku, Yao-Ching; Fu, Changlin; Luo, Miao; Philbin, Cecilia E.; Rossow, M.; Mele, T.C.; Kemp, Kevin G.

doi:10.1109/vlsit.1995.520864

Cited by 3 publications

(1 citation statement)

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“…Nitride-based ͑silicon nitride, silicon oxynitride͒ films have been demonstrated to have suitable optical characteristics for KrF and ArF lithography BARC applications. 4,5 Recently, hexamethyldisiloxane and carbon films have been shown to be suitable as BARC layers for F 2 lithography. 6,7 However, nitride-based BARC films are also preferred in F 2 lithography.…”

Section: Introductionmentioning

confidence: 99%

Optical-gradient antireflective coatings for 157-nm optical lithography applications

Chen¹,

Fan²,

Wang³

et al. 2004

Appl. Opt.

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We demonstrate an optical-gradient bottom antireflective coating (BARC) film, which can be easily prepared by treating a silicon nitride film with oxygen plasma. The oxygen composition is gradually decreased inside the silicon nitride film. The optical constants of the silicon nitride film are also changed gradually. A reflectance of less than 1% for various highly reflective substrates with high thickness-controlled tolerance has been achieved. The optical-gradient film is also shown to have high thermal stability during the postexposure bake procedure. Results indicate that the optical-gradient-type BARC is suitable in both ArF and F2 excimer lasers for sub-70-nm lithography applications.

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