1986
DOI: 10.1016/0168-583x(86)90016-9
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Damage accumulation in ceramics during ion implantation

Abstract: The damage structures of a-Al 2 O 3 and a-SiC were examined as functions of ion implantation parameters usino Rutherford backscattering-channeling, analytical electron microscopy, and Raman spectroscopy. Low temperatures or high fluences cf cations favor formation of the amorphous state. At 300 K, mass of the bombarding species has only a small effect on residual damage, but certain ion specias appear to stabilize the damage microstructure and increase the rate of approach to the amorphous state. The type of c… Show more

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Cited by 60 publications
(10 citation statements)
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“…One can also see that the disorder in the oxygen sublattice is greater than in the aluminium sublattice for all examined samples. This was also observed by McHargue et al [25].…”
Section: Resultssupporting
confidence: 71%
“…One can also see that the disorder in the oxygen sublattice is greater than in the aluminium sublattice for all examined samples. This was also observed by McHargue et al [25].…”
Section: Resultssupporting
confidence: 71%
“…18,19,21,22 All future mention of "as-implanted" material will imply samples that have been subjected to this recovery anneal. 18,19,21,22 All future mention of "as-implanted" material will imply samples that have been subjected to this recovery anneal.…”
Section: (3) Thermal Annealingmentioning
confidence: 99%
“…All analyses were performed on a Cameca IMS/3F SIMS according to procedures developed by Paulson et al 28 A 300-nA 18 O negative ion primary beam, operating at 14.5 keV, was rastered over a 250 m ϫ 250 m area producing a crater roughly 425 m on a side. All analyses were performed on a Cameca IMS/3F SIMS according to procedures developed by Paulson et al 28 A 300-nA 18 O negative ion primary beam, operating at 14.5 keV, was rastered over a 250 m ϫ 250 m area producing a crater roughly 425 m on a side.…”
Section: (4) Secondary Ion Mass Spectrometry (Sims)mentioning
confidence: 99%
“…In fact, numerous examples exist where the experimental results on amorphization of a given ceramic do not agree with each other in terms of the amount of displacement damage that is required to produce amorphization [ 1- 51. It has been recognized for several years that implanted ions can have a significant effect on the dose required to a m o r p k damage resistant materials. For example, the dose required to amorphize A1203 at room temperature with low-energy Zr ions is about 50 displacements per atom (dpa), whereas amorphization does not occur during irradiation with ions such as Nb and Cr for doses in excess of 100 dpa [3,6,7]. Unfortunately, most of the available results on amorphization of ceramics were obtained using ions with energies <300 keV.…”
Section: Introductionmentioning
confidence: 97%