Electron spins in silicon have long coherence times [1][2][3][4][5][6] and are a promising qubit platform [7,8]. However, electric field noise in semiconductors poses a challenge for most single-and multi-qubit operations in quantum-dot spin qubits [4,9,10]. Here, we investigate the dependence of lowfrequency charge noise spectra on temperature and aluminum-oxide gate dielectric thickness in Si/SiGe quantum dots with overlapping gates. We find that charge noise increases with aluminum oxide thickness. We also find strong dot-to-dot variations in the temperature dependence of the noise magnitude and spectrum. These findings suggest that each quantum dot experiences noise caused by a distinct ensemble of two-level systems, each of which has a non-uniform distribution of thermal activation energies. Taken together, our results suggest that charge noise in Si/SiGe quantum dots originates at least in part from a non-uniform distribution of two-level systems near the surface of the semiconductor.