2001
DOI: 10.3379/jmsjmag.25.855
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Decrease in Surface Roughness of c-Plane-oriented MnSb Films Prepared by Sputtering.

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Cited by 2 publications
(2 citation statements)
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“…A B20-type MnSi epitaxial layer was used as a template for the epitaxial growth of the following MnTe under-layer and Mn50(Te50-xSbx) films. The MnSi template layer was formed by a natural reaction between the Si substrate and a 1-nm-thick Mn layer with an elevated substrate temperature of 623 K 3,7) . As an under-layer, a c-plane oriented 50-nm-thick MnTe layer was formed on the MnSi template layer at 623 K by hetero-epitaxy.…”
Section: Methodsmentioning
confidence: 99%
See 1 more Smart Citation
“…A B20-type MnSi epitaxial layer was used as a template for the epitaxial growth of the following MnTe under-layer and Mn50(Te50-xSbx) films. The MnSi template layer was formed by a natural reaction between the Si substrate and a 1-nm-thick Mn layer with an elevated substrate temperature of 623 K 3,7) . As an under-layer, a c-plane oriented 50-nm-thick MnTe layer was formed on the MnSi template layer at 623 K by hetero-epitaxy.…”
Section: Methodsmentioning
confidence: 99%
“…NiAs-type MnSb with lattice parameters, a = 4.128 Å and c = 5.789 Å 1) , is a ferromagnetic substance whose magnetic easy axes <11.0> lie in the c-plane [1][2][3] as shown in Fig. 1 (a), while NiAs-type MnTe is an antiferromagnetic substance whose spins align ferromagnetically and parallel to the c-plane in each atomic plane of Mn and are antiferromagnetically coupled with the adjacent atomic plane 4) as shown in Fig.…”
Section: Introductionmentioning
confidence: 99%