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The relationship among the sputtering conditions, composition, microstructure, and magnetic properties of Co Si O granular film deposited using various metal oxide composite targets was investigated. The raw materials of the sintered targets were (a) (Co) (SiO2), (b) (Co) (Si) (Co3O4), and (c) (Co) (Si) (CoO) retaining the same nominal composition of (Co) 7.7mol%(SiO2), Co79.9Si6.7O13.4 (at%). It was found that; (1) in the case of Ar gas pressure (PAr) of 0.6 4.0 Pa, the discharge voltage with targets (b) and (c) was lower than that with target (a), (2) the oxygen content of the film became larger with increasing PAr from 0.6 8.0 Pa, (3) each granular film deposited by using the three targets