2000
DOI: 10.1134/1.1188024
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Deep-level centers in undoped p-GaAs layers grown by liquid phase epitaxy

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Cited by 9 publications
(5 citation statements)
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“…It is also essential that all three groups in the range of 350 K stable demonstrate the hole trap H2. In earlier studies, for example [9][10][11][12][13][14], in addition to background defects in the pin layers grown by LPE, typical hole traps A and B are present with activation energies E v = +0.41 eV and E v = +0.68 eV, respectively.…”
Section: Resultsmentioning
confidence: 91%
“…It is also essential that all three groups in the range of 350 K stable demonstrate the hole trap H2. In earlier studies, for example [9][10][11][12][13][14], in addition to background defects in the pin layers grown by LPE, typical hole traps A and B are present with activation energies E v = +0.41 eV and E v = +0.68 eV, respectively.…”
Section: Resultsmentioning
confidence: 91%
“…Using the method proposed in [4] we can pick out the total concentration of deep levels in the band gap. As seen from the DLTS spectra (Fig.…”
Section: Resultsmentioning
confidence: 99%
“…However, despite a certain success, the results reached in improving the switching speed for power diodes based on Si or GaAs "homojunction" structures fail to fully satisfy the upto-date power electronics needs. The minimal switching time of about 30-50 ns was demonstrated for diodes with blocking voltage U b of about 400-600 V [13][14][15][16].…”
Section: A Fast Recovery Eepitaxial Diodes (Fred) For Pulsedmentioning
confidence: 99%
“…Numerous attempts have been made to decrease the switching time for high voltage power Si and GaAs diodes down to a nanosecond level (see, e.g., [13,14,15]). However, despite a certain success, the results reached in improving the switching speed for power diodes based on Si or GaAs "homojunction" structures fail to fully satisfy the upto-date power electronics needs.…”
Section: A Fast Recovery Eepitaxial Diodes (Fred) For Pulsedmentioning
confidence: 99%