Deep submicron resist profile simulation and characterization of electron beam lithography system for cell projection and direct writing

Ham, Young-Mog

doi:10.1116/1.589636

Cited by 13 publications

(3 citation statements)

References 10 publications

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“…If we describe the sensitivity of the nanoparticle film by the threshold dose for production of exposed lines visible in the SEM, then a sensitivity of 80 mC cm −2 is derived. This value suggests that the nanoparticle film is about 600 times less sensitive in comparison with PMMA (quoted as 0.13 mC cm −2 ) [33]. However, this sensitivity lies at present within an order of magnitude or so of other high resolution negative tone electron beam resists, e.g.…”

Section: Fabrication Of Metallic Nanostructures By Direct Electron Be...mentioning

confidence: 87%

Nanostructures from nanoparticles

Mendes

Chen

Palmer

et al. 2003

J. Phys.: Condens. Matter

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This paper reviews recent experimental approaches to the development of surface nanostructures from nanoparticles. The formation of nanowires by electron beam writing in films of gold nanoparticles passivated with a specially designed class of ligand molecules (dialkyl sulfides) is presented, together with illustrations of practical nanostructures. Potential applications of this methodology are discussed. Another alternative to the controlled fabrication of arrays of nanoparticles, based on nanocrystals which contain molecular recognition elements in the ligand shell, is also surveyed. These particles aggregate in the presence of specifically designed molecular dications which act as a molecular binder. Finally, recent work on the formation of nanoscale surface architectures using x-ray patterning of self-assembled monolayers is introduced. Current and potential future applications of these surface nanostructures are discussed.

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Section: Fabrication Of Metallic Nanostructures By Direct Electron Be...mentioning

confidence: 87%

Nanostructures from nanoparticles

Mendes

Chen

Palmer

et al. 2003

J. Phys.: Condens. Matter

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“…To ensure the release of replicated plastic chip from the mold chip fabricated by deep X-ray exposure and electroplating, the wall of the high aspect ratio channels should have a slight inclination. Since it is too difficult for the conventional LIGA technology, we adopted the M 2 DXL technology [Ham et al, 1997]. …”

Section: Micro Capillary Array Electrophoresis Chip 41mentioning

confidence: 99%

“…One possible approach is to fabricate a special X-ray mask with inclined absorber. Nevertheless, this method has been proved very limited [Ham et al, 1997]. We once proposed M 2 DXL (Moving Mask Deep X-ray Lithography) technology to control the wall inclination of a microstructure by LIGA process [Tabata et al, 1999].…”

Section: Introductionmentioning

confidence: 99%

Micro Capillary Array Electrophoresis Chip by Moving Mask Liga Technology

You

Shinohara

Enami

et al. 2004

Int. J. Inf. Acquisition

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The concept and the fabrication process of a micro capillary array electrophoresis (µ-CAE) for DNA analysis were stated. The chip was mainly made of plastic and fabricated by the innovatory LIGA technology which included moving mask deep X-ray lithography, electroplating and hot embossing, and assembled by an adhesive bonding, in which the adhesive layer solidified and formed firm bond under UV exposure. The micro channel array with high aspect ratio is the key part, whose wall should have a slight inclination to ensure the demoulding. It was demonstrated that moving mask deep X-ray lithography (M 2 DXL) technology could successfully control the inclination and enabled to integrate micro optical components such as micro lens into the chip, which improved detection performance greatly. The fabrication process was experimented and some initial prototype chips have been obtained. Fluidic test and electrophoresis test with laser-induced fluorescence detection has been done on the prototype. The results confirm that the µ-CAE by moving mask LIGA process is realizable and it has great potential in high-throughput, which may lead to ultra-fast DNA analysis.

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Proximity-effect induced density limitations for electron-beam patterned planar photonic nanomaterials

Wüest

2009

Photonics and Nanostructures - Fundamentals and Applications

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Deep submicron resist profile simulation and characterization of electron beam lithography system for cell projection and direct writing

Abstract: Pattern matching, simulation, and metrology of complex layouts fabricated by electron beam lithography Proximity exposure effect analysis using the phenomenon of resist debris formation in electron beam lithography

Cited by 13 publications

References 10 publications

Nanostructures from nanoparticles

Nanostructures from nanoparticles

Micro Capillary Array Electrophoresis Chip by Moving Mask Liga Technology

Proximity-effect induced density limitations for electron-beam patterned planar photonic nanomaterials

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