1997
DOI: 10.1016/s0927-7765(96)01318-5
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Deep UV patterning of monolayers of crystalline S layer protein on silicon surfaces

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Cited by 35 publications
(18 citation statements)
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“…[214] Investigation of the irradiated S layer lattices showed that even a dosage of about 3500 mJ cm À2 (supplied in 10 shots at 350 mJ cm À2 each) led only to a carbonization and not to an ablation of the protein. [214] As determined by scanning force microscopy the step height between exposed and unexposed areas did not reach the thickness of the intact S layers.…”
Section: Patterning Of Recrystallized Surface Layersmentioning
confidence: 99%
See 1 more Smart Citation
“…[214] Investigation of the irradiated S layer lattices showed that even a dosage of about 3500 mJ cm À2 (supplied in 10 shots at 350 mJ cm À2 each) led only to a carbonization and not to an ablation of the protein. [214] As determined by scanning force microscopy the step height between exposed and unexposed areas did not reach the thickness of the intact S layers.…”
Section: Patterning Of Recrystallized Surface Layersmentioning
confidence: 99%
“…For this purpose, S-protein monolayers recrystallized on silicon wafers are irradiated by deep ultraviolet (DUV) laser radiation through a microlithographic mask possessing feature in the range of 1 mm to 200 nm (square and line patterns, Figure 14). [214] Drying of the S layer was necessary to avoid formation of interference fringes in the patterned S layer by a thin water layer between mask and substrate. The S layer could be completely removed by two pulses of ArF radiation (l 193 nm; dose: approximately 100 mJ cm À2 per pulse) in the exposed areas, while in the unexposed regions the structural and functional integrity was completely retained.…”
Section: Patterning Of Recrystallized Surface Layersmentioning
confidence: 99%
“…[ 6 ] A drawback of using photolithographic patterning techniques of biological adhesion molecules, however, is the generation of interference fringes in the patterned layers due to the necessity of a thin water fi lm to be present between the lithographic mask and protein layer that preserves the native protein conformation. [ 7 ] Among soft lithography techniques, microcontact printing (µCP), stencil-based patterning and microfl uidic patterning are most frequently used for co-culture systems. [ 8 ] More recently, tip-based direct protein printing of adhesion promoters was introduced for single cell co-cultures of 3T3 fi broblasts and C2C12 myoblasts.…”
mentioning
confidence: 99%
“…Beispielsweise können auf Silicium-Wafern rekristallisierte S-Schichten mit UV-Strahlung durch eine in der Mikrolithographie übliche Maske, die Strukturen in der Gröûe von 1 mm bis 200 nm aufweist (quadratische und linienförmige Muster), belichtet werden (Abbildung 14). [214] Zur Vermeidung von Interferenzmustern in der strukturierten S-Schicht erwies es sich als notwendig, noch vor der Belichtung den der Proteinmatrix anhaftenden dünnen Wasserfilm durch schonende Trocknung zu entfernen. Mit zwei Pulsen eines ArF-Excimerlasers (l 193 nm, Dosis: circa 100 mJ cm À2 pro Puls) konnte die S-Schicht in den belichteten Bereichen vollständig abgetragen werden, wobei in den nicht belichteten Bereichen die Struktur und biochemische Funktion des Proteingitters völlig erhalten blieb.…”
Section: Strukturierung Von Rekristallisierten S-schichtenunclassified
“…[214] Untersuchungen von solchen bestrahlten S-Schicht-Gittern haben ergeben, daû selbst eine Dosis von ca. 3500 mJ cm À2 (10 Pulse zu je ca.…”
Section: Strukturierung Von Rekristallisierten S-schichtenunclassified