2012
DOI: 10.1016/j.jnoncrysol.2011.11.017
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Defect models and electrical storage mechanism in GeSbTe phase change materials

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Cited by 18 publications
(13 citation statements)
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“…4(e)). In amorphous GeTe, E F is already pinned at the mid-gap by many mechanisms, as reported in previous works [22,28]. Thus, the small number of N-doping-induced gap states does not alter the E F behavior at the mid-gap in the amorphous phases.…”
supporting
confidence: 76%
“…4(e)). In amorphous GeTe, E F is already pinned at the mid-gap by many mechanisms, as reported in previous works [22,28]. Thus, the small number of N-doping-induced gap states does not alter the E F behavior at the mid-gap in the amorphous phases.…”
supporting
confidence: 76%
“…A similar concept has been successfully utilized in other solid functional materials in our theoretical modeling. 34,[41][42][43] The key difference between UMPL materials and conventional PL materials is that the electrons and holes can be separated and allocated at the deep localized levels in the optical band gap area, due to the extra deep trap levels near the valence band maximum (VBM) and the extra hole traps near the conduction band maximum (CBM), as shown in Fig. 1.…”
Section: Introductionmentioning
confidence: 99%
“…Impedance spectroscopy and I-V measurements show a similar temperature dependence for resistance and relaxation frequency with activation energies of about 0.36 eV, which identifies the location of the Fermi level in the forbidden energy gap [11]. When this value is compared with the measured optical gap [12,13], it showed that the Fermi level is pinned in the middle of the band gap and confirms the chalcogenide nature of Ge 2 Sb 2 Te 5 films [14]. Additionally, modulated photocurrent measurements performed on amorphous Ge 2 Sb 2 Te 5 display a pronounced valence band tail and two defect states [15].…”
Section: Introductionmentioning
confidence: 65%