2006
DOI: 10.1007/s10853-006-6563-2
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Defect structure in GaN pyramids

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Cited by 17 publications
(12 citation statements)
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“…2017, 5, 1600804 www.advancedsciencenews.com pyramidal volume, except for a small increase at the base. The increase in the structural defects at the base [35,36] is the likely cause of the increased YL emission. At 720 nm excitation, SHG generated at 360 nm results in the linear absorption of SHG photons into conduction band and subsequent relaxation to shallow states followed by recombination in the shallow donordeep acceptor states resulting in the increase in YL toward the base.…”
Section: Resultsmentioning
confidence: 99%
“…2017, 5, 1600804 www.advancedsciencenews.com pyramidal volume, except for a small increase at the base. The increase in the structural defects at the base [35,36] is the likely cause of the increased YL emission. At 720 nm excitation, SHG generated at 360 nm results in the linear absorption of SHG photons into conduction band and subsequent relaxation to shallow states followed by recombination in the shallow donordeep acceptor states resulting in the increase in YL toward the base.…”
Section: Resultsmentioning
confidence: 99%
“…This general behavior is also found for dislocations initially oriented along the [0001] growth direction if inclined facets appear during growth of GaN epitaxial layers. The dislocations then bend toward the inclined facet, [19][20][21]23,25,26,65 in order to minimize the line energy by shortening its length. Note, the dislocations in the cleaved samples likely do not reach their equilibrium line directions after cleavage at room temperature.…”
Section: Determination Of the Depth Of The Dislocation Corementioning
confidence: 99%
“…18 Therefore, the need to reduce the dislocation concentrations has led to growth schemes, where the dislocation lines are bent off the growth direction. [19][20][21][22][23][24][25][26] Hence, most dislocations are not present in their original line direction and may thus change their electronic properties. Therefore, it is particularly relevant to be able to identify the line direction of the dislocation cores.…”
Section: Introductionmentioning
confidence: 99%
“…[5][6][7][8][9][10][11][12][13][14][15] The common principle for dislocation reduction is the introduction of interfaces or inclined growth facets, which influence the line directions of threading dislocations. 7,[16][17][18][19][20][21] Inclined facets are also introduced by v-shaped pits or inverted pyramidal defects typically around threading dislocations in epitaxial layers of group III-nitride semiconductors. [22][23][24][25][26][27] These v-shaped defects are delimited by six inclined f11 22g semipolar facets.…”
mentioning
confidence: 99%
“…28 Dislocations were found to bend toward such inclined facets (produced by patterning of the substrates). 7,8,16,18,20,21,29 This attractive interaction was explained by the orientation dependent energy of dislocation lines, 19 the emergence of dislocations at inclined facets combined with the minimization of the length of the dislocation lines, 18 or/and by attractive strain effects due to image forces. 7 Recent images of the etched c growth surfaces suggest that the concentration of dislocations with c line direction component is lower in v-shaped defects than in the surrounding material.…”
mentioning
confidence: 99%