2017
DOI: 10.21205/deufmd.2017195654
|View full text |Cite
|
Sign up to set email alerts
|

Degradation of Triclosan by Photo-Fenton Oxidation

Abstract: Triclosan is one of the most used active ingredients in antibacterial personal care products and its usage increased in recent years. Triclosan has recently attracted the attention researchers from the fields of water treatment due to its existence in water environments. This study has been executed to investigate the removal of triclosan with photo-Fenton process and to observe by-product formation after oxidation. Effects of operational parameters namely the concentrations of Triclosan, H2O2 and Fe(II) on ox… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1

Citation Types

0
1
0

Year Published

2019
2019
2024
2024

Publication Types

Select...
3

Relationship

0
3

Authors

Journals

citations
Cited by 3 publications
(1 citation statement)
references
References 31 publications
0
1
0
Order By: Relevance
“…In another study where photon-Fenton oxidation was employed, the increase in concentration of OH radicals and catalysts had led to an increase in the concentration of intermediate products, a removal efficiency of 99.5% was achieved at an optimum dosage of H 2 O 2 /Fe(II)/TCS = 50/0.1/10. Cokay and Oztamer [84], however, this did not hinder the generation of intermediate products, In a study using H 2 O 2 as an oxidant and BiFeO 3 magnetic nanoparticles (BiFeO 3 MNPs) as catalysts has proven to solve the issue of accumulation of intermediate products by modifying the particle surface with EDTA ligands [85], also this facilitated in reducing removal time and increasing removal efficiency of TCS. In a study conducted by [86], photocatalysis was found to be a promising method for abatement of TCS than photolysis, an efficiency up to 82% was achieved; moreover, using OH radical has proven to be effective in eliminating dioxin intermediate, and the mechanism of photolysis and photocatalysis is shown in Fig.…”
Section: Advanced Oxidation Process (Aops)mentioning
confidence: 99%
“…In another study where photon-Fenton oxidation was employed, the increase in concentration of OH radicals and catalysts had led to an increase in the concentration of intermediate products, a removal efficiency of 99.5% was achieved at an optimum dosage of H 2 O 2 /Fe(II)/TCS = 50/0.1/10. Cokay and Oztamer [84], however, this did not hinder the generation of intermediate products, In a study using H 2 O 2 as an oxidant and BiFeO 3 magnetic nanoparticles (BiFeO 3 MNPs) as catalysts has proven to solve the issue of accumulation of intermediate products by modifying the particle surface with EDTA ligands [85], also this facilitated in reducing removal time and increasing removal efficiency of TCS. In a study conducted by [86], photocatalysis was found to be a promising method for abatement of TCS than photolysis, an efficiency up to 82% was achieved; moreover, using OH radical has proven to be effective in eliminating dioxin intermediate, and the mechanism of photolysis and photocatalysis is shown in Fig.…”
Section: Advanced Oxidation Process (Aops)mentioning
confidence: 99%