Delayed elastic effects in the glass ceramics Zerodur and ULE at room temperature

Pepi, John W.; Golini, Donald

doi:10.1364/ao.30.003087

Cited by 14 publications

(6 citation statements)

References 2 publications

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“…Zerodur), whereas ULE glass is a single-phase vitreous material consisting of SiO 2 and TiO 2 . [80][81][82] As described earlier, material complexity has a strong effect on the patterning process. During the etching of glass ceramics and other complex glasses, a large amount of non-volatile reaction products is generated, which makes structuring more difficult in a fluorine-based plasma.…”

Section: Microstructuring Of Ultra Low Expansion Glassesmentioning

confidence: 81%

Perspectives of reactive ion etching of silicate glasses for optical microsystems

Weigel

Brokmann

Hofmann

et al. 2021

J. Optical Microsystems

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We provide a review of the latest research findings as well as the future potential of plasma-based etching technology for the fabrication of micro-optical components and systems. Reactive ion etching (RIE) in combination with lithographic patterning is a well-established technology in the field of micro-and nanofabrication. Nevertheless, practical implementation, especially for plasma-based patterning of complex optical materials such as alumino-silicate glasses or glass-ceramics, is still largely based on technological experience rather than established models. Such models require an in-depth understanding of the underlying chemical and physical processes within the plasma and at the glass-plasma/mask-plasma interfaces. We therefore present results that should pave the way for a better understanding of processes and thus for the extension of RIE processes toward innovative three-dimensional (3D) patterning as well as for the processing of chemically and structurally inhomogeneous silicate-based substrates. To this end, we present and discuss the results of a variety of microstructuring strategies for different application areas with a focus on micro-optics. We consider the requirements for refractive and diffractive micro-optical systems and highlight potentials for 3D dry chemical etching by selective tailoring of the material structure. The results thus provide first steps toward a knowledge-based approach to RIE processing of universal dielectric glass materials for optical microsystems, which also has a significant impact on other microscale applications. © The Authors. Published by SPIE under a Creative Commons Attribution 4.0 International License. Distribution or reproduction of this work in whole or in part requires full attribution of the original publication, including its DOI.

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Section: Microstructuring Of Ultra Low Expansion Glassesmentioning

confidence: 81%

Perspectives of reactive ion etching of silicate glasses for optical microsystems

Weigel

Brokmann

Hofmann

et al. 2021

J. Optical Microsystems

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show abstract

“…That is nondestructive measurement differences of 0.070 ppb/K (or 70 ppt/K) range are now possible. Long-term dimensional stability 10,11 and no observed thermal hystereses 12,13 have also been pluses for using this single-phase glass material for EUVL optics and photomasks.…”

Section: Introductionmentioning

confidence: 89%

ULE^®Glass with Improved Thermal Properties for EUVL Masks and Projection Optics Substrates

Hrdina

Durán

2013

Int J of Appl Glass Sci

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Ultra-Low Expansion ULE â Glass is the material of choice for substrates for masks and projection optics mirrors in EUV lithography. A key parameter is the temperature of zero crossover (T zc ), which is the temperature at which the coefficient of thermal expansion (expansivity, a(T)) is equal to zero. As the temperature of the glass departs from T zc , the absolute value of a(T) increases proportionally to the slope of the expansivity curve. As EUVL matures, substrates will experience wider temperature changes, while higher resolution demands tighter constrains in substrate deformation. We present data showing that through modification of the fictive temperature of the glass, T f , the expansivity slope can be lowered. This is combined with better control of T zc , which can be tuned to a narrower range to better match the requirements of each substrate. Depending on the application, performance improvements can exceed 30% with respect to traditional ULE â Glass.

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“…[19] In addition to its extremely low mean linear coefficient of thermal expansion (0 AE 30 ppb K À1 from 5 to 35 °C), [20] ULE glass exhibits a long-term dimensional stability without any observable thermal hysteresis and delayed elasticity with a high thermal stability. [19,21,22] This makes this material more suitable for micromechanical applications than Zerodur with nearly identical thermal expansion properties.…”

Section: Micromechanical Materials In Comparison To Ultralow Expansio...mentioning

confidence: 99%

Ultralow Expansion Glass as Material for Advanced Micromechanical Systems

et al. 2023

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Ultralow expansion (ULE) glasses are of special interest for temperature stabilized systems for example in precision metrology. Nowadays, ULE materials are mainly used in macroscopic and less in micromechanical systems. Reasons for this are a lack of technologies for parallel fabricating high‐quality released microstructures with a high accuracy. As a result, there is a high demand in transferring these materials into miniaturized application examples, realistic system modeling, and the investigation of microscopic material properties. Herein, a technological base for fabricating released micromechanical structures and systems with a structure height above 100 μm in ULE 7972 glass is established. Herein, the main fabrication parameters that are important for the system design and contribute thus to the introduction of titanium silicate as material for glass‐based micromechanical systems are discussed. To study the mechanical properties in combination with respective simulation models, microcantilevers are used as basic mechanical elements to evaluate technological parameters and other impact factors. The implemented models allow to predict the micromechanical system properties with a deviation of only ±5% and can thus effectively support the micromechanical system design in an early stage of development.

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Delayed elastic effects in the glass ceramics Zerodur and ULE at room temperature

Abstract: The time-dependent phenomenon of delayed elasticity was studied at room temperature and is presented here for Zerodur and ULE. The effect is believed to be related to the alkali oxide content of the glass and to the rearrangement of the ion groups within the structure during stress.

Cited by 14 publications

References 2 publications

Perspectives of reactive ion etching of silicate glasses for optical microsystems

Perspectives of reactive ion etching of silicate glasses for optical microsystems

ULE^®Glass with Improved Thermal Properties for EUVL Masks and Projection Optics Substrates

Ultralow Expansion Glass as Material for Advanced Micromechanical Systems

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Delayed elastic effects in the glass ceramics Zerodur and ULE at room temperature

Abstract: The time-dependent phenomenon of delayed elasticity was studied at room temperature and is presented here for Zerodur and ULE. The effect is believed to be related to the alkali oxide content of the glass and to the rearrangement of the ion groups within the structure during stress.

Cited by 14 publications

References 2 publications

Perspectives of reactive ion etching of silicate glasses for optical microsystems

Perspectives of reactive ion etching of silicate glasses for optical microsystems

ULE®Glass with Improved Thermal Properties for EUVL Masks and Projection Optics Substrates

Ultralow Expansion Glass as Material for Advanced Micromechanical Systems

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Product

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About

ULE^®Glass with Improved Thermal Properties for EUVL Masks and Projection Optics Substrates