<scp>ULE</scp><sup>®</sup>Glass with Improved Thermal Properties for <scp>EUVL</scp> Masks and Projection Optics Substrates

Hrdina, Kenneth E.; Durán, C.

doi:10.1111/ijag.12041

Cited by 12 publications

(8 citation statements)

References 16 publications

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“…For the SMF-28 optical fiber we used, the values of α and β are 1.1 × 10 −5 K −1 [21] and 5.5 × 10 −7 K −1 [22] , respectively. For the ultralow-expansion (ULE) glass used in the F-P cavity method, the thermal expansion coefficient is better than 3 × 10 −8 K −1 from 5°C to 35°C [23] .…”

Section: Principle and Experimental Setupmentioning

confidence: 99%

All-fiber-based ultrastable laser with long-term frequency stability of 1.1 × 10-14

Huang

et al. 2023

Chin. Opt. Lett.

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We demonstrate an ultrastable miniaturized transportable laser system at 1550 nm by locking it to an optical fiber delay line (FDL). To achieve optimized long-term frequency stability, the FDL was placed into a vacuum chamber with a five-layer thermal shield, and a delicate two-stage active temperature stabilization, an optical power stabilization, and an RF power stabilization were applied in the system. A fractional frequency stability of better than 3.2 × 10 −15 at 1 s averaging time and 1.1 × 10 −14 at 1000 s averaging time was achieved, which is the best long-term frequency stability of an all-fiber-based ultrastable laser observed to date.

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Section: Principle and Experimental Setupmentioning

confidence: 99%

All-fiber-based ultrastable laser with long-term frequency stability of 1.1 × 10-14

Huang

et al. 2023

Chin. Opt. Lett.

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“…The coefficient of adhesion friction f was determined to be 0.04, by com FEA and scratching tests. As shown in Figures 2 and 3, the sliding process is divided into three stages, i.e., the indentation stage 1 , the sliding stage 2 , and the unloading stage 3 . The scratching depth, length, and speed are denoted as h max , l, and v, respectively.…”

Section: Finite Element Modelingmentioning

confidence: 99%

“…Fused silica, or silica-rich glass optics, are widely used in laser nuclear fusion devices [ 1 ], large astronomical telescopes [ 2 ], semiconductor technology [ 3 , 4 ], and consumer electronics. Subsurface damage has plenty of negative effects on the performance of optics, e.g., increasing optical scatter, reducing mechanical strength, and increasing laser-induced damage (LID).…”

Section: Introductionmentioning

confidence: 99%

An Investigation into the Densification-Affected Deformation and Fracture in Fused Silica under Contact Sliding

Ma²,

Sun

et al. 2022

Micromachines

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Subsurface damage of fused silica optics is one of the major factors restricting the performance of optical systems. The densification-affected deformation and fracture in fused silica under a sliding contact are investigated in this study, via three-dimensional finite element analysis (FEA). The finite element models of scratching with 70.3° conical and Berkovich indenters are established. A refined elliptical constitutive model is used to consider the influence of densification. The finite element models are experimentally verified by elastic recovery, and theoretically verified by hardness ratio. Results of densification and plastic deformation distributions indicate that the accuracy of existent sliding stress field models may be improved if the spherical/cylindrical yield region is replaced by an ellipsoid/cylindroid, and the embedding of the yield region is considered. The initiation sequence, and the locations and stages of radial, median, and lateral cracks are discussed by analyzing the predicted sliding stress fields. Median and radial cracks along the sliding direction tend to be the first cracks that emerge in the sliding and unloading stages, respectively. They coalesce to form a big median–radial crack that penetrates through the entire yield region. The fracture behavior of fused silica revealed in this study is essential in the low-damage machining of fused silica optics.

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“…Materials with very low thermal expansion, such as ULE glass or Zerodur glass-ceramics, are particularly interesting for applications in which the geometric variables of a system must be temperature-independent, for example, for masks for blanks in EUV lithography, for substrates in projection optics, and in precision metrology. [74][75][76][77][78][79] Ultra low expansion glass-ceramics are complex in composition and structure (e.g. Zerodur), whereas ULE glass is a single-phase vitreous material consisting of SiO 2 and TiO 2 .…”

Section: Microstructuring Of Ultra Low Expansion Glassesmentioning

confidence: 99%

Perspectives of reactive ion etching of silicate glasses for optical microsystems

Weigel

Brokmann

Hofmann

et al. 2021

J. Optical Microsystems

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We provide a review of the latest research findings as well as the future potential of plasma-based etching technology for the fabrication of micro-optical components and systems. Reactive ion etching (RIE) in combination with lithographic patterning is a well-established technology in the field of micro-and nanofabrication. Nevertheless, practical implementation, especially for plasma-based patterning of complex optical materials such as alumino-silicate glasses or glass-ceramics, is still largely based on technological experience rather than established models. Such models require an in-depth understanding of the underlying chemical and physical processes within the plasma and at the glass-plasma/mask-plasma interfaces. We therefore present results that should pave the way for a better understanding of processes and thus for the extension of RIE processes toward innovative three-dimensional (3D) patterning as well as for the processing of chemically and structurally inhomogeneous silicate-based substrates. To this end, we present and discuss the results of a variety of microstructuring strategies for different application areas with a focus on micro-optics. We consider the requirements for refractive and diffractive micro-optical systems and highlight potentials for 3D dry chemical etching by selective tailoring of the material structure. The results thus provide first steps toward a knowledge-based approach to RIE processing of universal dielectric glass materials for optical microsystems, which also has a significant impact on other microscale applications. © The Authors. Published by SPIE under a Creative Commons Attribution 4.0 International License. Distribution or reproduction of this work in whole or in part requires full attribution of the original publication, including its DOI.

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ULE^®Glass with Improved Thermal Properties for EUVL Masks and Projection Optics Substrates

Cited by 12 publications

References 16 publications

All-fiber-based ultrastable laser with long-term frequency stability of 1.1 × 10-14

All-fiber-based ultrastable laser with long-term frequency stability of 1.1 × 10-14

An Investigation into the Densification-Affected Deformation and Fracture in Fused Silica under Contact Sliding

Perspectives of reactive ion etching of silicate glasses for optical microsystems

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ULE®Glass with Improved Thermal Properties for EUVL Masks and Projection Optics Substrates

Cited by 12 publications

References 16 publications

All-fiber-based ultrastable laser with long-term frequency stability of 1.1 × 10-14

All-fiber-based ultrastable laser with long-term frequency stability of 1.1 × 10-14

An Investigation into the Densification-Affected Deformation and Fracture in Fused Silica under Contact Sliding

Perspectives of reactive ion etching of silicate glasses for optical microsystems

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Product

Resources

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ULE^®Glass with Improved Thermal Properties for EUVL Masks and Projection Optics Substrates