2013
DOI: 10.1109/jphotov.2013.2245722
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Demonstration of Multiple Substrate Reuses for Inverted Metamorphic Solar Cells

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Cited by 40 publications
(16 citation statements)
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“…In conventional ELO, lifted‐off layers are typically attached to flexible secondary handles using adhesives such as thermal releasing tape, wax, or glue . These adhesives can be bulky, heavy, brittle and subject to degradation while also requiring an additional transfer following the separation of the epitaxy onto an intermediate “handle” .…”
Section: Resultsmentioning
confidence: 99%
See 1 more Smart Citation
“…In conventional ELO, lifted‐off layers are typically attached to flexible secondary handles using adhesives such as thermal releasing tape, wax, or glue . These adhesives can be bulky, heavy, brittle and subject to degradation while also requiring an additional transfer following the separation of the epitaxy onto an intermediate “handle” .…”
Section: Resultsmentioning
confidence: 99%
“…Unfortunately, the promise of wafer reuse has not been fully realized, since the removal of the sacrificial layer results in residual surface damage, and leaves debris on the parent wafer surface. The most common method for preparing that surface for subsequent growth, therefore, has been by post lift‐off chemo‐mechanical polishing that reduces wafer thickness and ultimately inflicts additional damage, limiting reuse to only a very few growth and cleaning cycles …”
Section: Introductionmentioning
confidence: 99%
“…In theory this allows for a total weight reduction of more than 75% 11 . Additional cost reductions are possible since ELO allows for re-use of the expensive growth substrates 12,13 and there is the possibility to grow multiple devices on the same wafer and peeling them off separately one by one 14,15 . However, space is an extreme environment (for example high vacuum, harsh UV irradiation, charged particle radiation, atomic oxygen and thermal cycling 16 ), which provides additional challenges in solar panel design.…”
Section: Introductionmentioning
confidence: 99%
“…1,2 The strong demands for using III-V CSs as channel materials have led to platforms such as III-V CS on Si in order to realize cost-effective mass production. [3][4][5] Among the many experimental approaches, [6][7][8][9][10] wafer bonding and epitaxial lift-off (ELO) techniques have been preferred for accomplishing III-V CSs on Si. 6,7 Contrary to the direct epitaxial growth of III-V CSs on a lattice mismatched Si substrate, 8,9 a high-quality III-V channel is guaranteed by transferring the III-V CS layer from a lattice-matched III-V donor substrate to the Si, regardless of the lattice constant difference.…”
mentioning
confidence: 99%