2007
DOI: 10.1143/jjap.46.l190
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Demonstration of Nonpolar m-Plane InGaN/GaN Laser Diodes

Abstract: The first nonpolar m-plane ð1 1 100Þ nitride laser diodes (LDs) have been realized on low extended defect bulk m-plane GaN substrates. The LDs were grown by metal organic chemical vapor deposition (MOCVD) using conditions similar to that of c-plane device growth. Broad area lasers were fabricated and tested under pulsed conditions. Lasing was observed at duty cycles as high as 10%. These laser diodes had threshold current densities (J th ) as low as 7.5 kA/cm 2 . Stimulated emission was observed at 405.5 nm, w… Show more

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Cited by 218 publications
(122 citation statements)
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“…[25][26][27] Recent studies have shown significant improvements in high-power performance and lower threshold current densities of semipolar/nonpolar LDs. [28][29][30][31][32] It is also expected to have high modulation bandwidth and high-speed performance for semipolar/nonpolar LDs due to higher differential gain and lower threshold current density as shown in Eq. After the MOCVD growth and p-GaN activation, the sample was first cleaned by aqua regia (1:3 HNO 3 :HCl).…”
Section: High Speed Semipolar Laser Diodes: Devicesmentioning
confidence: 99%
“…[25][26][27] Recent studies have shown significant improvements in high-power performance and lower threshold current densities of semipolar/nonpolar LDs. [28][29][30][31][32] It is also expected to have high modulation bandwidth and high-speed performance for semipolar/nonpolar LDs due to higher differential gain and lower threshold current density as shown in Eq. After the MOCVD growth and p-GaN activation, the sample was first cleaned by aqua regia (1:3 HNO 3 :HCl).…”
Section: High Speed Semipolar Laser Diodes: Devicesmentioning
confidence: 99%
“…In addition, the availability of low-defect-density bulk GaN substrates sliced from boules with nonpolar and semipolar orientations allowed production of laser diodes at longer wavelengths approaching the Bgreen gap[ during last few years [90]- [100]. Table 2 summarizes the recent development of nitride-based LD emitting in the range of 400-500 nm.…”
Section: Paskova Et Al: Gan Substrates For Iii-nitride Devicesmentioning
confidence: 99%
“…To date, many techniques have previously been proposed for obtaining high-quality nonpolar GaN crystals [10]. Also, LEDs [11] and LDs [12] have been demonstrated using these techniques. Very few of these prior works involved a feasible and efficient process, though.…”
Section: Introductionmentioning
confidence: 99%