Dependence of catalytic properties of indium implanted SiO2 thin films on the film-substrate temperature during indium ion implantation

Yoshimura, Satoru; Ikuse, Kazumasa; Kiuchi, Masato; Nishimoto, Yoshihiro; Yasuda, Makoto; Baba, Akio; Hamaguchi, Satoshi

doi:10.1016/j.nimb.2013.04.072

Cited by 7 publications

(4 citation statements)

References 18 publications

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“…Experiments were performed using a low energy ion beam device [ 38 ]. A source gas was introduced into an ion source, and produced ions in the ion source were extracted by applying 15 kV voltage.…”

Section: Methodsmentioning

confidence: 99%

Low energy Si+, SiCH5+, or C+ beam injections to silicon substrates during chemical vapor deposition with dimethylsilane

Yoshimura

Sugimoto

Takeuchi

et al. 2023

Heliyon

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Section: Methodsmentioning

confidence: 99%

Low energy Si+, SiCH5+, or C+ beam injections to silicon substrates during chemical vapor deposition with dimethylsilane

Yoshimura

Sugimoto

Takeuchi

et al. 2023

Heliyon

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“…Experiments were performed using a low-energy mass-selected ion beam machine (Ulvac). The schematic drawing of the machine was shown in our previous paper [ 40 ]. The machine is composed of a Freeman-type ion source, a mass selector, and a processing chamber.…”

Section: Methodsmentioning

confidence: 99%

Identification of fragment ions produced by the decomposition of tetramethyltin and the production of low-energy Sn+ ion beam

et al. 2021

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Tetramethyltin was decomposed in an ion source and the fragment ions produced were identified using a low-energy mass-selected ion beam machine. Dominant fragment ions were found to be H+, CH2+, and Sn+. Subsequently, fragment ions were mass-selected. The mass spectrum of the selected ions indicated that only a single peak appeared at the mass number of 120 u, being suggestive of the presence of 120Sn+ ions. The ion energy was set at the range of 20–100 eV. The Sn+ ion beam was irradiated to a Si substrate, and a film was then found deposited on the substrate after the ion beam irradiation. An X-ray diffraction measurement showed that the film obtained was metallic Sn. Then, the Sn+ ion beam was irradiated to a quartz crystal microbalance substrate. We found that most of the irradiated Sn+ ions were adhered to the substrate, at the ion energy levels of 25 and 58 eV, producing the Sn film, whereas a 107 eV Sn+ beam caused a significant proportion of Sn atoms in the film to detach from the substrate, probably due to sputtering.

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“…Previously, we successfully synthesized a catalyst by exposing silicon dioxide films to an indium ion beam, using a low energy ion beam system [7][8][9]. Subsequently, we attempted to implant indium atoms in powdered materials using the same ion beam system, using pellets produced by compression molding.…”

Section: Introductionmentioning

confidence: 99%

Deposition of Indium Nanoparticles on Powdered Material by Pulse Arc Plasma to Synthesize Catalysts for Friedel-Crafts Alkylation

Yoshimura

Nishimoto

Sugimoto

et al. 2018

e-J. Surf. Sci. Nanotech.

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Indium nanoparticles were deposited on zeolite powders using a pulse arc plasma system. The resulting materials were capable of catalyzing an organic chemical reaction, namely the Friedel-Crafts alkylation between benzhydryl chloride and anisole. Varying the electrical capacitance in the plasma system (360 µF or 1080 µF) resulted in some changes in the indium concentration on the sample surface and in the size of the indium nanoparticles, but the catalytic ability of the material was largely unaffected.

show abstract

Dependence of catalytic properties of indium implanted SiO2 thin films on the film-substrate temperature during indium ion implantation

Cited by 7 publications

References 18 publications

Low energy Si+, SiCH5+, or C+ beam injections to silicon substrates during chemical vapor deposition with dimethylsilane

Low energy Si+, SiCH5+, or C+ beam injections to silicon substrates during chemical vapor deposition with dimethylsilane

Identification of fragment ions produced by the decomposition of tetramethyltin and the production of low-energy Sn+ ion beam

Deposition of Indium Nanoparticles on Powdered Material by Pulse Arc Plasma to Synthesize Catalysts for Friedel-Crafts Alkylation

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