2010
DOI: 10.1103/physrevb.81.033301
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Dependence of quantum-Hall conductance on the edge-state equilibration position in a bipolar graphene sheet

Abstract: By using four-terminal configurations, we investigated the dependence of longitudinal and diagonal resistances of a graphene p-n interface on the quantum-Hall edge-state equilibration position. The resistance of a p-n device in our four-terminal scheme is asymmetric with respect to the zero point where the filling factor (ν) of the entire graphene vanishes. This resistance asymmetry is caused by the chiral-direction-dependent change of the equilibration position and leads to a deeper insight into the equilibra… Show more

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Cited by 26 publications
(35 citation statements)
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“…Graphene p−n junctions have already displayed new and exciting phenomena such as Klein tunneling, where electrons traveling perpendicular to the junction experience zero resistance,144 fractional quantum Hall transport,145 and Veselago lensing, where diverging electron waves are refocused by the junction 146. Therefore, great efforts have been made to fabricate graphene p‐n junctions including multiple electrostatic gates,145, 147 chemical treatment by gas exposure,117 polymer‐induced doping,113, 148, 149 and electronic modification of the substrates 150. In the previous section, we have demonstrated the use of SAMs on SiO 2 substrates to control the charge accumulation at the dielectric/graphene interface, resulting p‐doping or n‐doping of graphene.…”
Section: Sams As Auxiliary Layers Carbon Nanomaterials As Active mentioning
confidence: 99%
“…Graphene p−n junctions have already displayed new and exciting phenomena such as Klein tunneling, where electrons traveling perpendicular to the junction experience zero resistance,144 fractional quantum Hall transport,145 and Veselago lensing, where diverging electron waves are refocused by the junction 146. Therefore, great efforts have been made to fabricate graphene p‐n junctions including multiple electrostatic gates,145, 147 chemical treatment by gas exposure,117 polymer‐induced doping,113, 148, 149 and electronic modification of the substrates 150. In the previous section, we have demonstrated the use of SAMs on SiO 2 substrates to control the charge accumulation at the dielectric/graphene interface, resulting p‐doping or n‐doping of graphene.…”
Section: Sams As Auxiliary Layers Carbon Nanomaterials As Active mentioning
confidence: 99%
“…7 One way to gain a better insight on the properties of these systems are multiterminal magnetotransport experiments, which can be used to study the equilibrium of the edge states at the junction. 8 Due to its bipolar nature, graphene offers the unique possibility to study the interaction of electron and hole edge states in a two-dimensional (2D) system.…”
mentioning
confidence: 99%
“…2(b)] channels being present in both regions travel across the sample, while the additional ones due to a higher carrier density and therefore filling factor ν = nh/eB circulate in only one region. This leads to different longitudinal resistances which are described by the Landauer-Büttiker formalism as fractions of the von Klitzing constant R K : 8,18,19 …”
mentioning
confidence: 99%
“…(2) would no longer be valid. Instead, it would be replaced by R = 1/G with In contrast to edge state mixing experiments in GaAs QWs [27,28] or graphene [2,7,31,32], our system is made up of two distinct constituent parts, and the electron and hole LL spectra differ vastly: m GaSb /m InAs ≈ 10 [35]. The electron and hole states are also spatially separated in the growth direction of the heterostructure.…”
Section: Figures 3(c) and 3(d) Show Line Cuts Ofmentioning
confidence: 99%