“…Ferromagnetic FeNi-ZnO thin films have been manufactured on glass by radio frequency (RF) magnetron co-sputtering [13] with background pressure below 1.2 × 10 −4 Pa and sputtering Ar pressure of 0.12 Pa. The sputtering power of Fe 25 Ni 75 target was fixed to 100 W. And the sputtering power of ZnO target was 20 W and 60 W during deposition.…”