“…To overcome this difficulty, impurity doping effect was investigated on In 0.04 Ga 0.96 As films grown on GaAs substrate by using Si donor atoms, the result of which shows a limited success that Si doping up to 5 Â 10 18 cm À3 is useful to increase the critical thickness by a factor of two from 100 to 200 nm. This effect was accounted for in terms of the Peierls stress [1,2]. Nevertheless, thicker films are still very difficult to grow.…”