2010
DOI: 10.1088/2040-8978/12/2/024009
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Dependence of the random laser behavior on the concentrations of dye and scatterers

Abstract: We have studied stimulated emission in a random laser based on rhodamine 6G dye and TiO2 nanoparticles. At both small and large concentrations of nanoparticles, the minimum threshold was found at ultra-high concentrations of dye, 20 g L−1. With the increase in concentration of TiO2 nanoparticles, the threshold reaches its maximum at the transition from a weak-scattering regime to a strong-scattering regime, when the transport mean free path lt is approximately equal to the absorption length la. At the same … Show more

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Cited by 68 publications
(56 citation statements)
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“…br PACS number(s): 42.55.Zz, 42.25.Dd, 05.40.Fb nonresonant regim e. T his feature has been first dem onstrated in Ref. [22], and was also recently corroborated in three-photon pum ped Z nO -based RLs in two different designs, namely, a ZnO -on-Si thin film [23] and a subm icron scale ZnO pow der [24], A nother im portant characteristic o f RLs is the threshold dependence on scatter concentration [25].…”
Section: Introductionmentioning
confidence: 80%
“…br PACS number(s): 42.55.Zz, 42.25.Dd, 05.40.Fb nonresonant regim e. T his feature has been first dem onstrated in Ref. [22], and was also recently corroborated in three-photon pum ped Z nO -based RLs in two different designs, namely, a ZnO -on-Si thin film [23] and a subm icron scale ZnO pow der [24], A nother im portant characteristic o f RLs is the threshold dependence on scatter concentration [25].…”
Section: Introductionmentioning
confidence: 80%
“…The threshold calculated using the "FWHM" criterion is ≈42 μJ. This difference can be explained as a consequence of very different values for the absorption length (l a ) and the transport mean free path (l t ) as shown in [38].…”
Section: B Rl Emissionmentioning
confidence: 97%
“…The linewidth of the lasing peak was ≈9 nm, which was six times narrower than the linewidth of the amplified spontaneous emission peak below the threshold. A threshold behavior was observed at ≈0.64 mJ as the integrated intensity increases nonlinearly with the pump power . The lasing threshold is clearly confirmed as a “kink” in the log–log plot (Figure c).…”
Section: Specific Reactive Ion Etching Conditions Used On Different Dmentioning
confidence: 99%