2014
DOI: 10.1016/j.tsf.2013.10.184
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Depolarization correction method for ellipsometric measurements of large grain size zinc-oxide films

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Cited by 5 publications
(3 citation statements)
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“…It is based on the measurement of the change in polarization state of light when reflected from the sample. Although the optimal samples show specular reflection, with the use of proper correction methods developed recently, samples with significant diffuse scattering can also be measured [16,17].…”
Section: Introductionmentioning
confidence: 99%
“…It is based on the measurement of the change in polarization state of light when reflected from the sample. Although the optimal samples show specular reflection, with the use of proper correction methods developed recently, samples with significant diffuse scattering can also be measured [16,17].…”
Section: Introductionmentioning
confidence: 99%
“…The effective medium approximation used to model the bulk layer is only valid where the size of phases are smaller than one tenth of the probing wavelength [33]. Additionally, surface roughness resulting from the overgrowth of competing crystallites can lead to scattering of the incident light, leading to depolarisation [33,34]. These issues were evident in the initial analysis of spectra taken between 193 and 1000 nm.…”
Section: Holdermentioning
confidence: 99%
“…There are other possible sources of depolarization which can occur in the case of parallel beam measurements as well, and which may affect the results of the ellipsometric evaluation, like the finite bandwidth of the spectrograph [18,19] and the inhomogeneity of film thickness. Most of the depolarization sources can be handled during the evaluation [20][21][22][23]. The description and handling of these sources are in the focus of intense research, meaning not only the development of new mathematical formulae [24], but also new measurement techniques [25].…”
Section: Introductionmentioning
confidence: 99%