Deposition and process development of AlN for MEMS acoustic sensor

Prasad, Mahanth; Kumar, Rajesh

doi:10.1016/j.vacuum.2018.08.062

Cited by 15 publications

(5 citation statements)

References 20 publications

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“…The three aluminum atoms (atoms 6, 7, and 8) also bind to other three nitrogen atoms (atoms 9, 10, and 11) through covalent bonds between the aluminum empty hybrid sublevel and the nitrogen complete hybrid sublevel, of ionic character, having a length of l 2 and 107.7° Thin Film Deposition -Fundamentals, Processes, and Applications angle between l 1 and l 2 . Those 11 atoms of aluminum and nitrogen (atoms 1, 2, 3, 4, 5,6,7,8,9,10,11) have the form of a prism of triangular base. This prismatic structure originates the wurtzite hexagonal AlN unit cell, as shown in Figure 3a, that presents the following lattice parameters a = b≅0.3100 nm and c = 0.4980 nm.…”

Section: Structure and Crystal Orientation Of The Aln Materialsmentioning

confidence: 99%

“…Aluminum nitride (AlN) thin films have attracted much attention due to their excellent properties suitable for the manufacture of devices, which meet various applications [1][2][3][4][5][6][7]. In addition to their properties highlighted in Figure 1, these materials have been much investigated due to their high piezoelectricity and high surface acoustic velocity (v ⊥ = 5600 m/s and v ∥ = 11,000 m/s) [2,3], suitable electromechanical coupling, chemical stability [3,[8][9][10][11][12][13] and good transparency in the region of the visible, infrared and ultraviolet [10,13].…”

Section: Introductionmentioning

confidence: 99%

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Development and Applications of Aluminum Nitride Thin Film Technology

Cunha¹,

Pimenta²,

Fraga³

2023

Thin Films - Deposition Methods and Applications

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Aluminum nitride (AlN) thin films have aroused the interest of researchers due to their unique physicochemical properties. However, further studies on these semiconductor materials are still necessary to establish the manufacturing of high-performance devices for applications in various areas, such as telecommunications, microelectronics, and biomedicine. This chapter introduces AlN thin film technology that has made a wide range of applications possible. First, the main physicochemical properties of AlN, its wurtzite crystalline structure, and the incorporation of oxygen during the thin film deposition process are presented. Furthermore, the growth of AlN films by different techniques and their applications as a buffer layer and sensing layer are summarized. Special attention was given to the sputtering deposition process and the use of sputtered AlN films in SAW sensors.

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Section: Structure and Crystal Orientation Of The Aln Materialsmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

Development and Applications of Aluminum Nitride Thin Film Technology

Cunha¹,

Pimenta²,

Fraga³

2023

Thin Films - Deposition Methods and Applications

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“…SU-8 is also a promising piezoelectric material for its advantage of low cost, ease to fabrication, and great variety of functionalities. Prasad and Kumar reported a MEMS-based piezoelectric acoustic sensor with SU-8 2025 to fabricate a microtunnel [21]. This acoustic sensor could have a good accuracy for the measurement of the sound with the range of a sound pressure level from 120 dB to 180 dB.…”

Section: Piezoelectric Acoustic Sensormentioning

confidence: 99%

A Review on the High Sound Pressure Level Acoustic Measurement in the Aerospace Field

Chen

Qin

et al. 2023

Journal of Sensors

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Noise could occur anywhere in the aerospace and other fields and has a great influence on the operation of the aircraft. The control of the sound emission has attracted a lot of attention from the economic and environmental aspects. Firstly, the noise is annoying for the passengers and pilot and may increase the risk to be exposed for the military applications. Secondly, the sound emission may pose a great damage and threat to the engine equipment due to the strong pressure oscillation. In addition, the combustion noise may also have a great influence on the combustion process in the engine, which may lead to the emission increase and low-efficiency operation. The noise emission measurement is necessary and very important for the research in aerospace field. The aircraft in aerospace field usually works in the extreme environment, and the noise emission is within a high sound pressure level, which is quite from the acoustic measurement in other fields. Thus, we give a short review to introduce the high sound pressure level acoustic measurement in the aerospace field.

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“…Nitriding is a thermochemical treatment method to improve the performances of metals, which has been also used to synthesize metal nitrides . In this method, nitrogen transports through the metals’ surface forming nitride precipitates, such as ferrous nitride, − titanium nitride, , and aluminum nitride (AlN). − Among the metal nitrides, AlN as a ceramic has excellent physical properties including high electrical resistivity (10 13 Ωcm), high thermal conductivity (320 W/m·K), small thermal expansion (4.6 × 10 –6 K –1 ), wide band gap (6.2 eV), low dielectric constant (8.8 at 1 MHz), wear resistance, and excellent chemical stability. − It has been widely used in various fields covering light-emitting diodes, acoustic sensors, solar cells, high-frequency electronic devices, and vibration energy harvesters. − …”

Section: Introductionmentioning

confidence: 99%

Numerical Simulation of Rapid Nitriding of Aluminum via Pulsed Laser

Ran

Cheng

et al. 2023

Ind. Eng. Chem. Res.

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To better understand the mechanisms of pulsed laser-assisted synthesis of metal nitride, a numerical model was proposed to simulate the process of laser nitriding of aluminum. The model incorporated various multiphysical processes in the laser nitriding process, including heating, melting and vaporization of aluminum, formation of plasma plume, shielding of laser energy, ionization of nitrogen gas, and the transport of nitrogen in the chemically active state N* (N atoms and N+ ions) inside the aluminum. The simulated results are in good agreement with the existing experimental results in terms of laser intensity, laser impulse, N+ lifetime in plume, and nitrogen diffusion depth in aluminum. The model can well simulate the laser shielding process by plume and the nitriding process of aluminum. Characteristics of the plume expansion, plasma formation, nitrogen ionization, and diffusion were investigated systematically by the developed model. Investigations on the effects of key operating conditions show that the impact of laser wavelength is negligible, while the full-width at half-maximum (FWHM), nitrogen gas pressure, and laser intensity have a significant impact on the laser nitriding process of aluminum. The larger FWHM and larger laser intensity yield a layer with a higher N* concentration and greater thickness. The higher nitrogen gas pressure leads to an increase in N* concentration at the same position.

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Deposition and process development of AlN for MEMS acoustic sensor

Cited by 15 publications

References 20 publications

Development and Applications of Aluminum Nitride Thin Film Technology

Development and Applications of Aluminum Nitride Thin Film Technology

A Review on the High Sound Pressure Level Acoustic Measurement in the Aerospace Field

Numerical Simulation of Rapid Nitriding of Aluminum via Pulsed Laser

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