Deposition Behavior of Boron-Doped Diamond with Varying Amount of Acetone by Hot Filament Chemical Vapor Deposition

Song, Chang; Jin, Rongguang; Hwang, Nong M.; Kim, Kwang Ho

doi:10.1007/s13391-019-00152-9

Cited by 7 publications

(2 citation statements)

References 32 publications

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“…This would refer to broad peaks found at around 1210 cm −1 in Figure 5b,c. This is manifested by impurities and defects as a result of relaxation of wave vector selection rules due to disorders [30][31][32][33]. Ushizawa and Mortet also note that when boron is doped with diamond, a broad peak at 490 cm −1 is also observed due to interference between continuous electron excitation and the center optic phonon in the discontinuous region [29][30][31][32][33].…”

Section: Resultsmentioning

confidence: 96%

Effect of Boron Doping on Diamond Film and Electrochemical Properties of BDD According to Thickness and Morphology

et al. 2020

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Diamond coating using hot-filament chemical vapor deposition (HFCVD) is now widely used in many fields. The quality of the diamond film and many factors determine the success of the coating, such as temperature, time, and pressure during coating. The purpose of this study was to produce coated boron-doped diamond (BDD) films by doping boron in the diamond film and to assess them through comparative analysis with foreign acid BDD, which is widely used as a water-treatment electrode in the present industry. The bending of the titanium substrate due to the high temperature during the diamond deposition was avoided by adding an intermediate layer with a columnar structure to niobium film. The filament temperature and pressure were determined through preliminary experiments, and BDD films were coated. The BDD film deposition rate was confirmed to be 100 nm/h, and the potential window increased with increasing thickness. The electrochemical activation and catalytic performance were confirmed according to the surface characteristics. Although the high deposition rate of the BDD coating is also an important factor, it was confirmed that conducting coating so that amorphous carbonization does not occur by controlling the temperature during coating can improve the electrochemical properties of BDD film.

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Section: Resultsmentioning

confidence: 96%

Effect of Boron Doping on Diamond Film and Electrochemical Properties of BDD According to Thickness and Morphology

et al. 2020

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“…The change in the diamond characterization peak due to boron doping is due to impurities and defects due to relaxation of the selection rule of the wave vector due to disturbance [21][22][23][24]. Additionally, when boron is doped into the diamond film, a broad peak is observed at 490 cm −1 due to interference between continuous electron excitation and the central optical phonon in the discontinuous region, as Ushizawa and Mortet noted [21][22][23][24]. A broad peak at 490 cm −1 was also observed in this study.…”

Section: Resultsmentioning

confidence: 99%

Electrochemical Properties and Chemical Oxygen Demand Depending on the Thickness of Boron-Doped Diamond

et al. 2020

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In this study, boron-doped diamond (BDD) film was deposited by hot-filament chemical vapor deposition (HFCVD) using acetone as the carbon source and trimethyl borate (TMB) as the boron source with the aim of lowering the manufacturing cost of BDD electrodes. The BDD film was deposited for 12 and 60 h to observe changes in the morphological behavior of the film as well as subsequent changes in the electrochemical properties. The morphology of the BDD film was not affected by the deposition time, but the thickness increased with increasing deposition time. As the deposition time increased, the deposition rate of the BDD film did not increase or decrease; rather, it remained constant at 100 nm/h. As the thickness of the BDD film increased, an increase in the potential window was observed. On the other hand, no distinct change was observed in the electrochemical activation and catalytic activity depending on the thickness, and there were not many differences. Chemical oxygen demand (COD) was measured to determine the practical applicability of the deposited BDD film. Unlike the potential window, the COD removal rate was almost the same and was not affected by the increase in the thickness of the BDD film. Both films under the two deposition conditions showed a high removal rate of 90% on average. This study confirms that BDD electrodes are much more useful for water treatment than the existing electrodes.

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Theoretical and experimental research on growth and doping mechanisms of diamond films fabricated using liquid carbon source precursors

Zhang

Liu

et al. 2023

Applied Surface Science

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Deposition Behavior of Boron-Doped Diamond with Varying Amount of Acetone by Hot Filament Chemical Vapor Deposition

Cited by 7 publications

References 32 publications

Effect of Boron Doping on Diamond Film and Electrochemical Properties of BDD According to Thickness and Morphology

Effect of Boron Doping on Diamond Film and Electrochemical Properties of BDD According to Thickness and Morphology

Electrochemical Properties and Chemical Oxygen Demand Depending on the Thickness of Boron-Doped Diamond

Theoretical and experimental research on growth and doping mechanisms of diamond films fabricated using liquid carbon source precursors

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