Deposition mechanism of aluminum on uranium in AlCl3-1-ethyl-3-methylimidazolium chloride ionic liquid by galvanic displacement

Jiang, Yidong; Fang, Liping; Luo, Lijie; Wang, Shaofei; Wang, Xiaolin

doi:10.1007/s10800-018-1204-4

Cited by 11 publications

(9 citation statements)

References 23 publications

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“…Although research using these solvent systems is primarily driven by electrochemical applications, ,,,, interest in them for EL processes is increasing. Several such examples have been cited throughout this article, including galvanic deposition of Al onto U using a AlCl 3 -EMIC RTIL (Aluminum section), EL Bi deposition onto Cu using an ethaline DES (Bismuth section), galvanic Re deposition onto Cu, Ni, or steel substrates using reline DES (Rhenium section), and galvanic Sn deposition onto Cu substrates using a ChCl-thiourea DES (Tin section), among others. ,,,,,− …”

Section: Discussionmentioning

confidence: 99%

“…This film inhibits Li dendrite growth during charge cycles and mitigates side reactions with electrolyte when the coated Li electrode is used as an anode with a LiFePO 4 cathode in a battery configuration. In similar fashion, Jiang et al report a simple procedure for spontaneously coating a uranium substrate with a protective Al film by simple immersion of the substrate in AlCl 3 –EMIC under anaerobic, dry conditions. Uranium metal is oxidized to U III and Al 2 Cl 7 – is directly reduced to Al metal: normalU 0 + 4 Al 2 Cl 7 − → Al 0 postfixfalse↓ infix+ normalU 3 + + 7 AlCl 4 − Al galvanically deposits directly onto U, generating a complex morphology comprising an ∼50 nm thick nanolayer of Al formed via direct reaction of Al III and U metal covered by loosely packed Al dendrites formed during the deposition of Al onto existing Al structures.…”

Section: Elementsmentioning

confidence: 99%

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Electroless Metallization of the Elements: Survey and Progress

Turró

Dressick

2022

ACS Appl. Electron. Mater.

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The electroless plating of metals and their alloys, oxides, and chalcogenides represents a critically important technology for the automotive, aerospace, machine tools, and, especially, the electronics industries. Since the initial efforts involving the plating of industrially important metals, such as Ni, Co, Cu, Ag, and Au, in the mid-20th century, the process has evolved to encompass a growing number of elements. At the same time, this expansion in the palette of accessible metals has enabled progress in these industries and evoked new nonconventional applications. In this review, we collect and survey available electroless processes in aqueous and organic solvent systems for each element organized according to position in the Periodic Table as a resource for the reader. Examples illustrating progress in the field are presented and are described in sufficient detail to be useful and understandable for both the expert and nonexpert. Given the historical importance of electronics as a driver for development of electroless processes, examples are electronics-related where possible. However, we strive to also include examples of applications in nontraditional fields to provide the reader with a sense of generality available for electroless methods. The review closes with an outlook for the field and a challenge to scientists and engineers to adapt electroless processes for new applications to continue the growth of the field.

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Section: Discussionmentioning

confidence: 99%

Section: Elementsmentioning

confidence: 99%

Electroless Metallization of the Elements: Survey and Progress

Turró

Dressick

2022

ACS Appl. Electron. Mater.

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“…The studies on the deposition of Al on the U substrate were continued by Wang and co-workers. In 2018 these authors delivered the information on the growth mechanism of the Al coating on uranium [ 144 ]. They have found that Al nano-layer passivates the uranium surface.…”

Section: Electrochemistry Of Targets Elementsmentioning

confidence: 99%

Potential Application of Ionic Liquids for Electrodeposition of the Material Targets for Production of Diagnostic Radioisotopes

2020

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An overview of the reported electrochemistry studies on the chemistry of the element for targets for isotope production in ionic liquids (ILs) is provided. The majority of investigations have been dedicated to two aspects of the reactive element chemistry. The first part of this review presents description of the cyclotron targets properties, especially physicochemical characterization of irradiated elements. The second part is devoted to description of the electrodeposition procedures leading to obtain elements or their alloys coatings (e.g., nickel, uranium) as the targets for cyclotron and reactor generation of the radioisotopes. This review provides an evaluation of the role ILs can have in the production of isotopes.

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“…Al has also been used as a corrosion protection layer for uranium (Egert and Scott, 1987; Jiang et al, 2017). Recently, electroless deposition of Al from [EMIm]Cl/AlCl 3 on uranium was shown to be an effective method for coating uranium (Jiang et al, 2018). The galvanic displacement reaction of Al on U takes place according to Equation (8).…”

Section: Electroless Deposition Of Non-noble Metalsmentioning

confidence: 99%

A Review on the Electroless Deposition of Functional Materials in Ionic Liquids for Batteries and Catalysis

2019

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Developing functional materials via electroless deposition, without the need of external energy is a fascinating concept. Electroless deposition can be subcategorized into galvanic displacement reaction, disproportionation reaction, and deposition in presence of reducing agents. Galvanic displacement reaction is a spontaneous reduction process wherein the redox potentials of the metal/metal ion in the electrolyte govern the thermodynamic feasibility of the process. In aqueous solutions, the galvanic displacement reaction takes place according to the redox potentials of the standard electrochemical series. In comparison, in the case of ionic liquids, galvanic displacement reaction can be triggered by forming metal ion complexes with the anions of the ionic liquids. Therefore, the redox potentials in ILs can be different to those of metal complexes in aqueous solutions. In this review, we highlight the progress in the electroless deposition of metals and semiconductors nanostructures, from ionic liquids and their application toward lithium/sodium batteries, and in catalysis.

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Deposition mechanism of aluminum on uranium in AlCl3-1-ethyl-3-methylimidazolium chloride ionic liquid by galvanic displacement

Cited by 11 publications

References 23 publications

Electroless Metallization of the Elements: Survey and Progress

Electroless Metallization of the Elements: Survey and Progress

Potential Application of Ionic Liquids for Electrodeposition of the Material Targets for Production of Diagnostic Radioisotopes

A Review on the Electroless Deposition of Functional Materials in Ionic Liquids for Batteries and Catalysis

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