Deposition of Amorphous CN_x Materials in BrCN Plasmas: Exploring Adhesion Behavior as an Indicator of Film Properties

Abstract

Adhesion and delamination behavior of amorphous carbon nitride (a-CN(x)) is critical to development of wear resistant materials and protective coatings. Here, the composition and delamination behavior of a-CN(x) films was explored utilizing BrCN, CH₃CN, and CH₄ as film precursors, either alone or in combination with one another. Film delamination depends on film thickness and plasma composition as well as post deposition treatment conditions. Delamination is not observed with films deposited from 100% CH₃CN discharges, whereas films of similar thickness deposited from 100% BrCN plasmas delaminate almost immediately upon exposure to atmosphere. Exploration of these differences in delamination behavior is discussed relative to contributions of humidity, hydrocarbon species, and ion bombardment during deposition in conjunction with compositional studies using X-ray photoelectron spectroscopy (XPS).

NiFePB-modified ZnO/BiVO4 photoanode for PEC water oxidation

“…5(b)) can be divided into three peaks: a wider peak centered at 288.5 eV ascribed to the CO bond, C–C (284.8 eV) and C–O (286.0 eV). 42,43 A distinguishing feature of the C–N bond can be seen in the N 1s region of Fig. 5(c), which displays a single peak centered at 397.7 eV.…”

Nitrogen-Doped Carbon Materials for the Metal-Free Reduction of Nitro Compounds

“…Typically, the C 1s spectrum can be divided into several kinds of peaks with different binding energies for the NC-950 catalyst (Figure ). The different types of carbon in the catalyst are listed as follows: C β (283.0 eV), C–C, C–H, and CC (284.6 eV), C–O (286.2 eV), CN (287.1 eV), CO (288.2 eV), C–N (288.9 eV), shake-up carbon (290.1 eV), respectively. , The nitrogen content of the synthesized materials determined by XPS is shown in Table . The atomic percentage of nitrogen decreased from 30.4 to 19.5 to 11.9 atom % for NC-650, NC-800, and NC-950, respectively.…”

Surface Functionalization by Plasma Treatment and Click Chemistry of a New Family of Fluorinated Polymeric Materials for Microfluidic Chips

“…Moreover, the FTIR‐ATR spectra of THV‐modified COC clearly show characteristic bands of the presence of OH groups (3 300–3 100 cm −1 ). It should be stressed that oxygen is an unavoidable contaminant of the substrate surface coming either from residual oxygen in the plasma reaction chamber or from long‐lived free radical reaction with oxygen upon air release after plasma pretreatment . The formation of carbonyl and hydroxyde groups on the surface are responsible for the hydrophilicity change of THV after argon plasma pre‐treatement observed in Figure .…”